摘要:
A scanning X-ray fluorescence spectrometer includes a quantitatively analyzing device (18) which calculates the concentration of hexavalent chrome based on the fact that the peak spectroscopic angle, at which the maximum intensity is attained in Cr—Kα line (22), changes depending on the ratio of the concentration of the hexavalent chrome vs. the concentration of the intensity of the total chrome. A plurality of detecting device (23) having different resolutions as a combination of a divergence slit (11), a spectroscopic device (6), a receiving slit (20) and a detector (8) is provided such that when the change of the peak spectroscopic angle is to be detected, a detecting device (23B) having a higher resolution than that of the detecting device (23A), which is selected when the concentration or the intensity of the total chrome is to be determined, is selected.
摘要:
A scanning X-ray fluorescence spectrometer includes a quantitatively analyzing device (18) which calculates the concentration of hexavalent chrome based on the fact that the peak spectroscopic angle, at which the maximum intensity is attained in Cr-Kα line (22), changes depending on the ratio of the concentration of the hexavalent chrome vs. the concentration of the intensity of the total chrome. A plurality of detecting device (23) having different resolutions as a combination of a divergence slit (11), a spectroscopic device (6), a receiving slit (20) and a detector (8) is provided such that when the change of the peak spectroscopic angle is to be detected, a detecting device (23B) having a higher resolution than that of the detecting device (23A), which is selected when the concentration or the intensity of the total chrome is to be determined, is selected.
摘要:
An X-ray fluorescence analyzing method includes irradiating a liquid sample (3A) containing hydrogen and at least one element of carbon, oxygen and nitrogen with primary X-rays (2); measuring the intensity F of fluorescent X-rays (4) from each of elements in the sample (3A) and having the atomic number 9 to 20, and the intensity S of scattered X-rays (12) from the sample (3A) caused by continuous X-rays in the primary X-rays; and calculating the concentration of each of the elements, based on the ratio between the measured intensity F, and the measured intensity S. The wavelength of the scattered X-rays (12) is so chosen as to be shorter than that of the fluorescent X-rays (4) and is so set that the measured intensity S and the mass absorption coefficient thereof are inversely proportional to each other within the range of variation of a composition of the sample (3A).
摘要:
An X-ray fluorescence analyzing method includes irradiating a liquid sample (3A) containing hydrogen and at least one element of carbon, oxygen and nitrogen with primary X-rays (2); measuring the intensity F of fluorescent X-rays (4) from each of elements in the sample (3A) and having the atomic number 9 to 20, and the intensity S of scattered X-rays (12) from the sample (3A) caused by continuous X-rays in the primary X-rays; and calculating the concentration of each of the elements, based on the ratio between the measured intensity F, and the measured intensity S. The wavelength of the scattered X-rays (12) is so chosen as to be shorter than that of the fluorescent X-rays (4) and is so set that the measured intensity S and the mass absorption coefficient thereof are inversely proportional to each other within the range of variation of a composition of the sample (3A).
摘要:
Where an object to be analyzed in an X-ray fluorescence analysis is a thin film sample, the X-ray fluorescence spectrometer facilitates selection of proper secondary X-ray lines to be measured to thereby facilitate an accurate analysis. The spectrometer includes a measuring line evaluating means 23 operable to calculate for each specified secondary X-ray line to be measured, a first theoretical intensity at a specified thickness and a composition of each of layers in the thin film and a second theoretical intensity at the thickness and the composition thereof when the thickness or a concentration has been changed by a predetermined quantity, to calculate a precision of a thickness or a precision of the concentration based on the first and second theoretical intensities, and to determine applicability or inapplicability of an analysis using the specified secondary X-ray line to be measured.
摘要:
A fluorescent X-ray analyzing apparatus capable of being used as either a wavelength dispersive type or an energy dispersive type is provided, with which the analysis can be performed quickly and accurately. The fluorescent X-ray analyzing apparatus includes a detecting unit for detecting and analyzing fluorescent X-ray (5) emitted from at least one target area (1a) of a sample (1) to be analyzed as a result of excitation of such target area (1a) with a primary X-ray (3). The detecting unit includes a wavelength dispersive type detecting unit (6) including a spectroscope (8) and a first detector (9), and an energy dispersive type detecting unit (11) including a second detector (12) of an energy dispersive type. The angle &thgr;1 formed between a first path (81) of travel of the fluorescent X-ray from the target area (1a) towards the spectroscope (8) and a surface of the sample (1) is equal to the angle &thgr;2 formed between a second path (82) of travel of the fluorescent X-ray from the target area (1a) towards the second detector (12) of the energy dispersive type and a surface of the sample (1), but the second path (82) is shorter than the first path (81).
摘要:
To provide an X-ray fluorescence spectrometer capable of providing a stable fluorescent X-ray intensity regardless of the presence of irregularities or the like on a surface of a sample to be analyzed, the X-ray fluorescence spectrometer includes an X-ray source 1 including a primary X-ray limiting diaphragm 3. An aperture 3a of the primary X-ray limiting diaphragm 3 is of a shape effective to allow change in intensity of fluorescent X-rays 7 measured by a detector 8 to be not higher than 1% in the event that a height of the sample surface 5a relative to the X-ray source 1 and the detector 8 changes 1 mm at maximum.