公开(公告)号：US08614049B2

公开(公告)日：2013-12-24

申请号：US13313990

申请日：2011-12-07

申请人： Yoshiyuki Utsumi ,  Masaru Takeshita ,  Hiroaki Shimizu ,  Syo Abe ,  Yoshitaka Komuro

发明人： Yoshiyuki Utsumi ,  Masaru Takeshita ,  Hiroaki Shimizu ,  Syo Abe ,  Yoshitaka Komuro

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/028

CPC分类号： G03F7/0397 ,  G03F7/0045

摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a nitrogen-containing organic compound (C) containing a compound (C1) represented by general formula (c1) shown below and an acid-generator component (B) which generates acid upon exposure (excluding the compound (C1)) (R1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M+ represents an organic cation).

摘要翻译： 一种抗蚀剂组合物，其含有在酸作用下在显影液中溶解度变化的碱成分（A），含有下述通式（c1）表示的化合物（C1）的含氮有机化合物（C）和酸 发生器组分（B）（不包括化合物（C1））（R1表示可具有取代基的碳原子数为5以上的脂环族基团）; X表示二价连接基团; Y表示直链状，支链状的 或环状亚烷基或亚芳基; Rf表示含氟原子的烃基，M +表示有机阳离子。