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    Method and Apparatus for Cleaning a Substrate
    3.
    发明申请
    Method and Apparatus for Cleaning a Substrate 审中-公开
    清洗基材的方法和装置

    公开(公告)号：US20120111360A1

    公开(公告)日：2012-05-10

    申请号：US12943868

    申请日：2010-11-10

    申请人： Helmuth Treichel ,  Flint Thorne ,  Rito Ligutom

    发明人： Helmuth Treichel ,  Flint Thorne ,  Rito Ligutom

    IPC分类号： B08B7/00 ,  A46B13/00

    CPC分类号： B08B1/02 ,  A46B13/001 ,  A46B2200/3086 ,  B08B1/04 ,  H01L21/67046 ,  H01L21/67219

    摘要： An integrated cleaner for processing disks is provided. The integrated cleaner includes a pair of spaced apart scrubbers each having a plurality of spaced apart brushes disposed along a length of the scrubbers, the pair of spaced apart scrubbers oriented horizontally and configured to receive a vertically oriented disk therebetween. A track is disposed below a gap defined between the pair of spaced apart scrubbers. The track guides an edge of the disk as the disk travels between ends of the pair of spaced apart scrubbers. The plurality of spaced apart brushes includes a first and/or second pair of opposing brushes having a roughness that is greater than a second and/or third pair of brushes downstream from the first and/or second pair of brushes, respectively. The integrated cleaner includes an edge cleaner configured to exert a force along an edge of the vertically oriented disk during a portion of travel of the vertically oriented disk along the track. A method of cleaning a substrate is also provided.

    摘要翻译： 提供了一种用于处理磁盘的集成清洁器。 集成清洁器包括一对间隔开的洗涤器，每个洗涤器具有沿洗涤器长度设置的多个间隔开的刷子，一对间隔开的洗涤器水平地定向并且构造成在其间容纳垂直取向的盘。 轨道设置在限定在一对间隔开的洗涤器之间的间隙的下方。 当盘在两对间隔开的洗涤器的端部之间行进时，轨道引导盘的边缘。 多个间隔开的刷子包括第一和/或第二对相对的刷子，其具有大于分别从第一和/或第二对刷子下游的第二和/或第三对刷子的粗糙度。 集成清洁器包括边缘清洁器，其构造成在垂直定向的盘沿着轨道的行进的一部分期间沿着垂直取向的盘的边缘施加力。 还提供了清洁基板的方法。

    SUBSTRATE NEST WITH DRIP REMOVER
    4.
    发明申请
    SUBSTRATE NEST WITH DRIP REMOVER 审中-公开
    基板NEST与DRIP REMOVER

    公开(公告)号：US20110186088A1

    公开(公告)日：2011-08-04

    申请号：US12697260

    申请日：2010-01-31

    申请人： Kenneth C. Miller ,  Rito Ligutom ,  Helmuth Treichel ,  Flint Thorne

    发明人： Kenneth C. Miller ,  Rito Ligutom ,  Helmuth Treichel ,  Flint Thorne

    IPC分类号： B08B3/00

    CPC分类号： H01L21/67057 ,  H01L21/67313

    摘要： An apparatus for supporting a work piece is provided. The apparatus includes outer support rails having support slots for supporting the work piece, the outer support rails disposed on opposing sides of the apparatus between opposing end members of the apparatus. Inner support rails extend between the opposing end members of the apparatus. An inner surface of each of the inner support rails has vertically disposed extensions extending therefrom. The vertically disposed extensions are aligned in pairs along a length of the inner support rails. A moveable device is disposed between the pairs of vertically disposed extensions. The moveable device is buoyantly moveable so that as the work piece is lifted, the moveable device follows. A method for cleaning a work piece is also included.

    摘要翻译： 提供一种用于支撑工件的装置。 该装置包括具有用于支撑工件的支撑槽的外部支撑轨道，设置在该装置的相对端部构件的相对侧上的外部支撑轨道。 内部支撑轨道在装置的相对的端部构件之间延伸。 每个内部支撑轨道的内表面具有从其延伸的垂直设置的延伸部。 垂直设置的延伸部沿着内部支撑轨道的长度成对排列。 可移动装置设置在成对的垂直设置的延伸部之间。 可移动装置是可浮动的，因此当工件被提起时，移动装置跟随。 还包括用于清洁工件的方法。

    METHOD FOR SUBSTRATE SURFACE CLEANING
    5.
    发明申请
    METHOD FOR SUBSTRATE SURFACE CLEANING 审中-公开
    基板表面清洗方法

    公开(公告)号：US20120111361A1

    公开(公告)日：2012-05-10

    申请号：US13041166

    申请日：2011-03-04

    申请人： Helmuth Treichel ,  Flint Thorne ,  Rito Ligutom ,  Jim Swertel

    发明人： Helmuth Treichel ,  Flint Thorne ,  Rito Ligutom ,  Jim Swertel

    IPC分类号： B08B7/00 ,  B24B1/00

    CPC分类号： B08B1/02 ,  A46B13/001 ,  A46B2200/3086 ,  B08B1/04 ,  H01L21/67046 ,  H01L21/67219

    摘要： A method for cleaning and polishing a disk is provided. The method includes planarizing the disk and transferring the planarized disk to a first station of a polishing module. At the first station opposing sides of the disk are simultaneously polished as the disk rotates around an axis of the disk. The polishing includes continuously advancing a first polishing member contacting a first surface of the disk and a second polishing member contacting a second surface of the disk, wherein the advancing of the first polishing member independent of the advancing of the second polishing member. The method includes transferring the disk to a second station of the polishing module.

    摘要翻译： 提供了一种清洁和抛光盘的方法。 该方法包括平坦化盘并将平坦化的盘传送到抛光模块的第一站。 当盘绕盘的轴线旋转时，在盘的相对侧的第一站同时抛光。 抛光包括连续前进接触盘的第一表面的第一抛光构件和与盘的第二表面接触的第二抛光构件，其中第一抛光构件的前进与第二抛光构件的前进无关。 该方法包括将光盘传送到抛光模块的第二站。