HAT CAPABLE OF RECOVERING ORIGINAL SHAPE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20230366146A1

    公开(公告)日:2023-11-16

    申请号:US17742766

    申请日:2022-05-12

    申请人: Young Hwan CHANG

    发明人: Young Hwan CHANG

    IPC分类号: A42B1/002 A42C1/08

    CPC分类号: A42B1/002 A42C1/08

    摘要: A hat capable of recovering the original shape and a method of manufacturing the same are provided. The hat is characterized by preparing mixtures comprising waterborne polyurethane, water, and crosslinking agent; coating synthetic fiber yarns of the hat with the mixture; curing the mixtures in a certain temperature condition in order to form a thin polyurethane film on the surface of fabric or knitted fabric for the hat. The curing reaction products by the waterborne polyurethane component implement a shape recovery of the hat after the deformation or damage due to the external force in the initial shape of the hat.