Surface treatment apparatus
    1.
    发明授权
    Surface treatment apparatus 有权
    表面处理装置

    公开(公告)号:US09243326B2

    公开(公告)日:2016-01-26

    申请号:US13636874

    申请日:2011-03-17

    IPC分类号: C23C16/455

    摘要: A surface treatment apparatus in which a disk-like sample-holding plate is provided inside an enclosure constituting a cylindrical circumferential wall. A cylindrical portion in an upper portion of the enclosure constitutes a material fluid supplying channel, and a channel provided on the lateral side of the sample-holding plate in the enclosure and shaped spreading as it goes farther from the cylindrical portion constitutes a fluid discharge channel. The fluid discharge channel employs a parabola curve or the like in which the position of the upper end of the outmost circumference of the sample-holding plate is defined as a focus position and the position of the upper end of the outlet that is symmetrically opposite to the focus position is defined as a reference position.

    摘要翻译: 一种表面处理装置,其中盘形样品保持板设置在构成圆柱形周壁的外壳的内部。 外壳的上部的圆筒部分构成材料流体供给通道,并且设置在外壳中的样品保持板的侧面上的通道,并且随着与圆柱形部分更远的形状扩散,构成流体排出通道 。 流体排出通道使用抛物线曲线等,其中将样品保持板的最外周的上端的位置定义为聚焦位置,并且出口的上端的位置对称地相对于 焦点位置被定义为参考位置。

    SURFACE TREATMENT APPARATUS
    2.
    发明申请
    SURFACE TREATMENT APPARATUS 有权
    表面处理设备

    公开(公告)号:US20130008610A1

    公开(公告)日:2013-01-10

    申请号:US13636874

    申请日:2011-03-17

    IPC分类号: B05C13/02 C23C16/458

    摘要: A surface treatment apparatus in which a disk-like sample-holding plate is provided inside an enclosure constituting a cylindrical circumferential wall. A cylindrical portion in an upper portion of the enclosure constitutes a material fluid supplying channel, and a channel provided on the lateral side of the sample-holding plate in the enclosure and shaped spreading as it goes farther from the cylindrical portion constitutes a fluid discharge channel. The fluid discharge channel employs a parabola curve or the like in which the position of the upper end of the outmost circumference of the sample-holding plate is defined as a focus position and the position of the upper end of the outlet that is symmetrically opposite to the focus position is defined as a reference position.

    摘要翻译: 一种表面处理装置,其中盘形样品保持板设置在构成圆柱形周壁的外壳的内部。 外壳的上部的圆筒部分构成材料流体供给通道,并且设置在外壳中的样品保持板的侧面上的通道,并且随着与圆柱形部分更远的形状扩散,构成流体排出通道 。 流体排出通道使用抛物线曲线等,其中将样品保持板的最外周的上端的位置定义为聚焦位置,并且出口的上端的位置对称地相对于 焦点位置被定义为参考位置。