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公开(公告)号:US20230225039A1
公开(公告)日:2023-07-13
申请号:US18118039
申请日:2023-03-06
IPC分类号: H05G2/00
摘要: A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. In some embodiments, a nozzle tube is arranged within the nozzle of the droplet generator, and the nozzle tube includes a structured nozzle pattern configured to provide an angular momentum to the target droplets.
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公开(公告)号:US20200004160A1
公开(公告)日:2020-01-02
申请号:US16420134
申请日:2019-05-22
申请人: Yu-Chih CHEN , Po-Chung CHENG , Li-Jui CHEN , Shang-Chieh CHIEN , Sheng-Kang YU , Wei-Chun YEN
发明人: Yu-Chih CHEN , Po-Chung CHENG , Li-Jui CHEN , Shang-Chieh CHIEN , Sheng-Kang YU , Wei-Chun YEN
摘要: An EUV collector mirror for an extreme ultra violet (EUV) radiation source apparatus includes an EUV collector mirror body on which a reflective layer as a reflective surface is disposed, a heater attached to or embedded in the EUV collector mirror body and a drain structure to drain melted metal from the reflective surface of the EUV collector mirror body to a back side of the EUV collector mirror body.
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