TOP-GATE TRANSISTOR ARRAY SUBSTRATE
    2.
    发明申请
    TOP-GATE TRANSISTOR ARRAY SUBSTRATE 有权
    顶栅晶体管阵列基板

    公开(公告)号:US20130009144A1

    公开(公告)日:2013-01-10

    申请号:US13286902

    申请日:2011-11-01

    IPC分类号: H01L29/24

    摘要: A top-gate transistor array substrate includes a transparent substrate with a plane, an ion release layer, a pixel array, and a first insulating layer. The ion release layer is disposed on the transparent substrate and completely covers the plane. The pixel array is disposed on the ion release layer and includes a plurality of transistors and a plurality of pixel electrodes. Each of the transistors includes a source, a drain, a gate and a MOS (metal oxide semiconductor) layer. The drain, the source and the MOS layer are disposed on the ion release layer. The pixel electrodes are electrically connected to the drains respectively. The gate is disposed above the MOS layer. The first insulating layer is disposed between the MOS layers and the gates. The MOS layer contacts the ion release layer. The ion release layer can release a plurality of ions into the MOS layers.

    摘要翻译: 顶栅晶体管阵列基板包括具有平面的透明基板,离子剥离层,像素阵列和第一绝缘层。 离子剥离层设置在透明基板上并完全覆盖平面。 像素阵列设置在离子剥离层上,并且包括多个晶体管和多个像素电极。 每个晶体管包括源极,漏极,栅极和MOS(金属氧化物半导体)层。 漏极,源极和MOS层设置在离子剥离层上。 像素电极分别与漏极电连接。 栅极设置在MOS层的上方。 第一绝缘层设置在MOS层和栅极之间。 MOS层与离子释放层接触。 离子剥离层可以将多个离子释放到MOS层中。