Method for Producing High Quality Animal Oil with Low Cholesterol Levels
    1.
    发明申请
    Method for Producing High Quality Animal Oil with Low Cholesterol Levels 有权
    生产低胆固醇水平的高品质动物油的方法

    公开(公告)号:US20150173389A1

    公开(公告)日:2015-06-25

    申请号:US14503824

    申请日:2014-10-01

    IPC分类号: A23D9/04

    CPC分类号: C11B3/16 C11B1/025

    摘要: The invention provides a method for producing high-quality lard or beef tallow with low cholesterol content. The method of the invention uses enzyme hydrolysis, centrifugation separation and homogenization-assisted embedding technique to obtain high-quality lard or beef tallow with low cholesterol levels. The method uses aqueous enzymatic extraction (AEE) techniques to separate lard or beef tallow from the raw material of pork or beef fat, and uses the homogenization-assisted embedding technique to remove cholesterol from the lard and beef tallow products. The method of the invention produces high quality lard with good oxidative stability at a high yield and can meet the Chinese national standard for first grade lard. The lard of the invention needs no further degumming process, eliminating the tedious refinery steps.

    摘要翻译: 本发明提供一种生产低胆固醇含量的优质猪油或牛油的方法。 本发明方法采用酶水解,离心分离,匀浆辅助包埋技术,获得低胆固醇含量的猪油或牛油。 该方法采用水提酶法(AEE)技术从猪肉或牛脂原料中分离出猪油或牛脂,采用均质辅助包埋技术,从猪油和牛脂产品中除去胆固醇。 本发明的方法以高产率生产具有良好氧化稳定性的高品质猪油,符合中国国家一级猪油标准。 本发明的猪油不需要进一步的脱胶处理,消除了繁琐的炼油步骤。

    Method for producing high quality animal oil with low cholesterol levels

    公开(公告)号:US09920278B2

    公开(公告)日:2018-03-20

    申请号:US14503824

    申请日:2014-10-01

    IPC分类号: A23D9/04 C11B3/16 C11B1/02

    CPC分类号: C11B3/16 C11B1/025

    摘要: The invention provides a method for producing high-quality lard or beef tallow with low cholesterol content. The method of the invention uses enzyme hydrolysis, centrifugation separation and homogenization-assisted embedding technique to obtain high-quality lard or beef tallow with low cholesterol levels. The method uses aqueous enzymatic extraction (AEE) techniques to separate lard or beef tallow from the raw material of pork or beef fat, and uses the homogenization-assisted embedding technique to remove cholesterol from the lard and beef tallow products. The method of the invention produces high quality lard with good oxidative stability at a high yield and can meet the Chinese national standard for first grade lard. The lard of the invention needs no further degumming process, eliminating the tedious refinery steps.

    Polishing method and polishing device
    3.
    发明授权
    Polishing method and polishing device 有权
    抛光方法和抛光装置

    公开(公告)号:US08758090B2

    公开(公告)日:2014-06-24

    申请号:US13328846

    申请日:2011-12-16

    IPC分类号: B24B37/04

    CPC分类号: B24B37/34 B24B37/245

    摘要: A polishing method includes: mounting a wafer on a fixed abrasive polishing pad located on a polishing platen; delivering a polishing slurry to the fixed abrasive polishing pad to polish the wafer; and adsorbing abrasive particles generated during the polishing process with an electrode. The electrode has a polarity opposite to a polarity of charges of the abrasive particles. A polishing device includes a polishing platen, a fixed abrasive polishing pad, a slurry pipeline and a polarity changer having an electrode. Therefore, the abrasive particles generated during the polishing process are removed, which prevents the wafer from being scratched, thereby increasing wafer yield and improving efficiency.

    摘要翻译: 抛光方法包括:将晶片安装在位于抛光平台上的固定研磨抛光垫上; 将抛光浆料输送到固定研磨抛光垫以抛光晶片; 并用电极吸附在抛光过程中产生的磨料颗粒。 电极具有与磨料颗粒的电荷极性相反的极性。 抛光装置包括抛光台板,固定研磨抛光垫,浆料管道和具有电极的极性更换器。 因此,在抛光过程中产生的磨料颗粒被去除,从而防止晶片被划伤,从而提高晶片的产量并提高效率。

    POLISHING METHOD AND POLISHING DEVICE
    4.
    发明申请
    POLISHING METHOD AND POLISHING DEVICE 有权
    抛光方法和抛光装置

    公开(公告)号:US20120190278A1

    公开(公告)日:2012-07-26

    申请号:US13328846

    申请日:2011-12-16

    IPC分类号: B24B1/00

    CPC分类号: B24B37/34 B24B37/245

    摘要: A polishing method includes: mounting a wafer on a fixed abrasive polishing pad located on a polishing platen; delivering a polishing slurry to the fixed abrasive polishing pad to polish the wafer; and adsorbing abrasive particles generated during the polishing process with an electrode. The electrode has a polarity opposite to a polarity of charges of the abrasive particles. A polishing device includes a polishing platen, a fixed abrasive polishing pad, a slurry pipeline and a polarity changer having an electrode. Therefore, the abrasive particles generated during the polishing process are removed, which prevents the wafer from being scratched, thereby increasing wafer yield and improving efficiency.

    摘要翻译: 抛光方法包括:将晶片安装在位于抛光平台上的固定研磨抛光垫上; 将抛光浆料输送到固定研磨抛光垫以抛光晶片; 并用电极吸附在抛光过程中产生的磨料颗粒。 电极具有与磨料颗粒的电荷极性相反的极性。 抛光装置包括抛光台板,固定研磨抛光垫,浆料管道和具有电极的极性更换器。 因此,在抛光过程中产生的磨料颗粒被去除,从而防止晶片被划伤,从而提高晶片的产量并提高效率。