Sample contamination method
    1.
    发明授权
    Sample contamination method 有权
    样品污染方法

    公开(公告)号:US08771535B2

    公开(公告)日:2014-07-08

    申请号:US13188719

    申请日:2011-07-22

    IPC分类号: H01L21/66 G01N1/28

    摘要: A sample contamination method according to an embodiment includes spraying a chemical solution containing contaminants into a casing, carrying a semiconductor substrate into the casing filled with the chemical solution by the spraying, leaving the semiconductor substrate in the casing filled with the chemical solution for a predetermined time, and carrying the semiconductor substrate out of the casing after the predetermined time passes.

    摘要翻译: 根据一个实施方案的样品污染方法包括将含有污染物的化学溶液喷射到壳体中,通过喷射将半导体衬底携带到填充有化学溶液的壳体中,使半导体衬底在填充有化学溶液的壳体中保持预定的 时间,并且在预定时间过去之后将半导体衬底从套管中提出。