公开(公告)号：US5273586A

公开(公告)日：1993-12-28

申请号：US772859

申请日：1991-10-08

申请人： Yun-Kee Kim ,  Chun-Soo Bann

发明人： Yun-Kee Kim ,  Chun-Soo Bann

IPC分类号： C23C16/44 ,  H01L21/205 ,  H01L21/22 ,  H01L21/31 ,  H01L21/318 ,  C23C16/56 ,  C23C16/46

CPC分类号： C23C16/4401

摘要： A low pressure chemical vapor deposition apparatus is provided for removing particulate matter. The apparatus includes a bell jar, a quartz tube installed in the bell jar, a slotted quartz boat installed in the quartz tube and for holding wafers which are to be coated with film. The apparatus further includes a gas line for introducing a reactant gas into the chamber within the quartz tube, where the quartz boat is located, a gas inlet made of quartz, an MFC, a valve 10 a three-zone furnace for heating the quartz tube to a reaction temperature, a pump 4 for pumping out air and reactant gas from the chamber within the quartz tube, a door plate for placing the slotted quartz boat in the chamber a power source device for causing an electric current to charge contacts with a positive or negative bias which are provided on the door plate, and a main controller for operating the power source device.

摘要翻译： 提供了一种低压化学气相沉积装置，用于去除颗粒物质。 该装置包括钟罩，安装在钟罩中的石英管，安装在石英管中的开槽石英舟，并用于保持待涂覆薄膜的晶片。 该装置还包括用于将反应气体引入石英管内的石英管中的室内的气体管线，由石英制成的气体入口，MFC，阀门10，用于加热石英管的三区域炉 到反应温度，用于从石英管内的室抽出空气和反应气体的泵4，用于将开槽的石英舟放置在室中的门板，用于使电流与阳极充电的电源装置 或负偏压，以及用于操作电源装置的主控制器。