摘要:
A multiple-beam ion-beam assembly consisting of two or more concentrically arranged ring-shaped ion-beam sources having ion-beam slits that emit a plurality of ion beams which overlap on the surface being treated and thus ensure uniformity in distribution of ion currents on the treated surface. Since the ion-beam assembly consists of a plurality of individual source, uniform treatment can be performed on a large surface area. Several embodiments of the invention cover the systems with individual sources adjustable with respect to one another, with an oblique angle of incidence of beams emitted from individual source, and with combination of oblique angles and adjustable sources.
摘要:
The ion source of the invention emits ion beams radially inwardly or radially outwardly from the entire periphery of the closed-loop ion-emitting slit. In one embodiment, a tubular or oval-shaped hollow body, which also functions as a cathode, contains a similarly-shaped concentric anode spaced from the inner walls of the cathode at a distance required to form an ion-generating and accelerating space. The cathode has a continuous ion-emitting slit which is aligned with the position of the anode and is concentric thereto. A magnetic-field generation means is located inside the ring-shaped anode. When the ion source is energized by inducing an magnetic field, connecting the anode to a positive pole of the electric power supply unit, the cathode to a negative pole of the power supply unit, and supplying a working medium into the hollow housing, the electrons begin to drift in the annular space between the anode and cathode in the same direction in which the ions are emitted from the annular slit. By rearranging positions of magnet, anode, and cathode, it is possible to provide emission of ions in the inward or outward direction for treating outer or inner surfaces of tubular objects.