公开(公告)号：US20010047665A1

公开(公告)日：2001-12-06

申请号：US09850709

申请日：2001-05-07

Applicant: Zenastra Photonics Inc.

Inventor： Zhiyi Zhang ,  Gaozhi Xiao ,  Guang Pan ,  Pinqing Zhang ,  Ming Zhou

IPC: C03C003/06

CPC classification number: C03C4/0042 ,  C03C1/006 ,  C03C1/008 ,  C03C3/06 ,  C03C17/25 ,  C03C2201/22 ,  C03C2201/31 ,  C03C2201/32 ,  C03C2201/3476 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/26 ,  C03C2217/213 ,  C03C2217/24 ,  C03C2218/113

Abstract: Deuterium oxide, D2O, also called heavy water, is used for the hydrolysis of silanes and metal compounds. The D2O-hydrolyzed silanes polycondense much easier than H2O-hydrolyzed silanes, resulting in a fast SinullOnullSi network build up. The most important feature of using D2O is that the final materials are 100% free of OnullH and the residual OnullD bond does not have an absorption peak in the wavelength range of 1.0 to 1.8 nullm, which is crucial in reducing optical loss at the wavelengths of 1.3 and especially 1.55 nullm. OnullH free sol-gel materials with low optical loss have been developed based on this process. D2O may be applied in all kinds of hydrolysis-processes, such as the sol-gel process of silanes and metal compounds, the synthesis of polysiloxane, and may be extended to other silica and metal-oxides deposition processes for example, flame hydrolysis deposition (FHD) whenever water is used or OnullH bond involved. The concept of replacing OnullH bond with OnullD bond is applicable to any OnullH bond containing materials used in optical based telecommunication.

Abstract translation: 氧化氘（D2O）也被称为重水，用于水解硅烷和金属化合物。 D2O水解的硅烷聚缩醛比H2O水解的硅烷容易得多，导致快速的Si-O-Si网络积聚。 使用D2O最重要的特征是最终的材料是100％不含OH，并且残留的OD键在1.0-1.8μm的波长范围内不具有吸收峰，这对减少波长的光损耗至关重要 1.3，特别是1.55。 基于该方法开发了具有低光损耗的O-H游离溶胶凝胶材料。 D2O可以应用于各种水解过程，如硅烷和金属化合物的溶胶 - 凝胶法，聚硅氧烷的合成，并可扩展到其他二氧化硅和金属氧化物沉积工艺，例如火焰水解沉积（ FHD）每当使用水或涉及OH键时。 用O-D键替代O-H键的概念适用于光通信中使用的任何含O-H键的材料。