公开(公告)号：US20240116798A1

公开(公告)日：2024-04-11

申请号：US18538353

申请日：2023-12-13

申请人： NIKON CORPORATION

发明人： Shuhei TAKASU ,  Kohei YOSHIMOTO

IPC分类号： C03C3/068 ,  G02B1/02

CPC分类号： C03C3/068 ,  G02B1/02 ,  C03C2201/10 ,  C03C2201/3417 ,  C03C2201/42

摘要： An optical glass comprising: by cation %, more than 0% and up to 40% of a content rate of La3+; 15% to 65% of a content rate of Ti4+; and more than 0% and up to 20% of a content rate of Zr4+; wherein a refractive index (nd) with respect to a d-line is from 2.00 to 2.35.

公开(公告)号：US20180118604A1

公开(公告)日：2018-05-03

申请号：US15802731

申请日：2017-11-03

申请人： Regents of the University of Minnesota

发明人： William Orion Nachlas

IPC分类号： C03C3/06

CPC分类号： C03C3/06 ,  C03C2201/42

摘要： Techniques for precise and accurate doping of nanoporous silica gel or silica glass that include forming a silica gel slurry that includes an activated silica gel and a solvent, adding a metal dopant to the silica gel slurry to form a mixture, mixing the mixture of the metal dopant and the silica gel slurry, and removing the solvent from the mixture to form a doped silica gel.

公开(公告)号：US09932261B2

公开(公告)日：2018-04-03

申请号：US15297534

申请日：2016-10-19

申请人： Corning Incorporated

发明人： Sezhian Annamalai ,  Steven Bruce Dawes ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina ,  William Rogers Rosch ,  Bryan Ray Wheaton

IPC分类号： C03C3/06 ,  C03C3/089 ,  C03B25/02 ,  C03C4/00 ,  C03B19/14

CPC分类号： C03C3/089 ,  C03B19/14 ,  C03B25/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/10 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/00 ,  C03C23/007 ,  C03C2201/10 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/54

摘要： A doped silica-titania (“DST”) glass article that includes a glass article having a glass composition comprising a silica-titania base glass containing titania at 7 to 14 wt. % and a balance of silica, and a dopant selected from the group consisting of (a) F at 0.7 to 1.5 wt. %, (b) B2O3 at 1.5 to 5 wt. %, (c) OH at 1000 to 3000 ppm, and (d) B2O3 at 0.5 to 2.5 wt. % and OH at 100 to 1400 ppm. The glass article has an expansivity slope of less than about 1.3 ppb/K2 at 20° C. For DST glass articles doped with F or B2O3, the OH level can be held to less than 10 ppm, or less than 100 ppm, respectively. In many aspects, the DST glass articles are substantially free of titania in crystalline form.

公开(公告)号：US09890071B2

公开(公告)日：2018-02-13

申请号：US15291379

申请日：2016-10-12

申请人： Corning Incorporated

发明人： Carlos Alberto Duran

IPC分类号： C03C3/06 ,  C03B25/00 ,  C03B25/02 ,  C03B25/08 ,  C03C3/076

CPC分类号： C03B25/00 ,  C03B25/02 ,  C03B25/08 ,  C03B2201/42 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/00 ,  C03C2201/42 ,  Y02P40/57

摘要： Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650° C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.

公开(公告)号：US20180016176A1

公开(公告)日：2018-01-18

申请号：US15716084

申请日：2017-09-26

申请人： NIKON CORPORATION

发明人： Toshio YOSHINARI ,  Tadahiko SAITO

IPC分类号： C03B19/14 ,  C03C3/04 ,  C03B23/00 ,  C03C3/06 ,  C03B32/00 ,  C03B23/049 ,  C03B11/00

CPC分类号： C03B19/1415 ,  C03B11/00 ,  C03B19/1453 ,  C03B19/1469 ,  C03B19/1476 ,  C03B19/1492 ,  C03B23/0013 ,  C03B23/0496 ,  C03B32/005 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/04 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52

摘要： A device for manufacturing SiO2—TiO2 based glass by growing a glass ingot upon a target by a direct method. The device includes the target, comprising a thermal storage portion that accumulates heat by being preheated, and a heat insulating portion that suppresses conduction of heat from the thermal storage portion in a direction opposite to the glass ingot.

公开(公告)号：US20170038672A1

公开(公告)日：2017-02-09

申请号：US15041113

申请日：2016-02-11

申请人： SHIN-ETSU CHEMICAL CO., LTD.

发明人： Shigeru Maida ,  Hisatoshi Otsuka ,  Tetsuji Ueda ,  Masanobu Ezaki

IPC分类号： G03F1/24 ,  C03C3/06 ,  C03C4/08 ,  C03B19/14

CPC分类号： G03F1/24 ,  C03B19/1415 ,  C03B19/1423 ,  C03B2201/42 ,  C03B2207/64 ,  C03C3/06 ,  C03C4/0085 ,  C03C4/08 ,  C03C2201/42 ,  C03C2203/42 ,  G03F1/50

摘要： On an EUV light-reflecting surface of titania-doped quartz glass, an angle (θ) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.

摘要翻译： 在二氧化钛掺杂石英玻璃的EUV光反射表面上，包括在连接反射表面中心的原点（O）与双折射测量点（A）之间的直线和 在测量点（A）处的双折射具有大于45度的平均值。 由于双折射的快轴以同心的方式分布，所以可获得适用于EUV光刻的具有高平坦度的二氧化钛掺杂石英玻璃基板。

公开(公告)号：US20160355429A1

公开(公告)日：2016-12-08

申请号：US15176259

申请日：2016-06-08

申请人： Momentive Performance Materials Inc.

发明人： Kipyung Ahn ,  Guangjun Xu ,  Martin Panchula ,  Samuel Conzone ,  Tianjun Rong ,  Konstantin S. Zuyev ,  Yen Zhou

IPC分类号： C03C3/06 ,  C03C4/08 ,  A61J1/14 ,  C03C4/20

CPC分类号： C03C3/06 ,  A61J1/00 ,  A61J1/1468 ,  B65D1/00 ,  C03B1/00 ,  C03B17/04 ,  C03C4/00 ,  C03C4/085 ,  C03C4/20 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/32 ,  C03C2201/3423 ,  C03C2201/42 ,  C03C2203/10 ,  C03C2204/00 ,  Y10T428/131

摘要： A high silica glass composition comprising about 92 to about 99.9999 wt. % SiO2 and from about 0.0001 to about 8 wt. % of at least one dopant selected from Al2O3, CeO2, TiO2, La2O3, Y2O3, Nd2O3, other rare earth oxides, and mixtures of two or more thereof. The glass composition has a working point temperature ranging from 600 to 2,000° C. These compositions exhibit stability similar to pure fused quartz, but have a moderate working temperature to enable cost effective fabrication of pharmaceutical packages. The glass is particularly useful as a packaging material for pharmaceutical applications, such as, for example pre-filled syringes, ampoules and vials.

公开(公告)号：US09505649B2

公开(公告)日：2016-11-29

申请号：US14474427

申请日：2014-09-02

申请人： Corning Incorporated

发明人： Carlos Alberto Duran

IPC分类号： C03C3/06 ,  C03B25/02 ,  C03B25/08 ,  C03B25/00 ,  C03C3/076

CPC分类号： C03B25/00 ,  C03B25/02 ,  C03B25/08 ,  C03B2201/42 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/00 ,  C03C2201/42 ,  Y02P40/57

摘要： Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650° C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.

摘要翻译： 在宽范围的零交叉温度下具有小的温度变化系数的二氧化硅 - 二氧化钛玻璃以及用于制造眼镜的方法。 该方法包括在两种不同温度方案下具有受控退火的冷却方案。 较高的温度控制退火可能在750°C-950°C的温度区间或其次间隔发生。 较低的温度控制退火可以在650℃-875℃或其子间隔的温度区间内进行。 受控退火允许独立控制二氧化硅 - 二氧化钛玻璃的CTE斜率和Tzc。 独立控制提供固体组合物的二氧化硅 - 二氧化钛玻璃的CTE斜率和Tzc值，迄今为止只能通过组成变化来实现。

公开(公告)号：US09494851B2

公开(公告)日：2016-11-15

申请号：US14348413

申请日：2013-03-28

申请人： HOYA CORPORATION

发明人： Toshihiko Orihara ,  Kazuhiro Hamamoto ,  Hirofumi Kozakai ,  Youichi Usui ,  Tsutomu Shoki ,  Junichi Horikawa

IPC分类号： G03F1/50 ,  G03F1/22 ,  G02B5/08 ,  G03F1/48 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/20 ,  C03C3/06 ,  C03C17/34 ,  C03C17/36 ,  C03C23/00

CPC分类号： G03F1/48 ,  B82Y10/00 ,  B82Y40/00 ,  C03C3/06 ,  C03C17/3435 ,  C03C17/3626 ,  C03C17/3636 ,  C03C17/3639 ,  C03C17/3649 ,  C03C17/3665 ,  C03C23/0075 ,  C03C2201/42 ,  C03C2218/33 ,  G02B5/08 ,  G02B5/0816 ,  G02B5/0891 ,  G03F1/22 ,  G03F7/16 ,  G03F7/2002 ,  G03F7/2004 ,  G03F7/70733 ,  H01L21/3081 ,  H01L21/3085

摘要： Disclosed is a mask blank substrate for use in lithography, wherein the main surface on which the transfer pattern of the substrate is formed has a root mean square roughness (Rms) of not more than 0.15 nm obtained by measuring an area of 1 μm×1 μm with an atomic force microscope, and has a power spectrum density of not more than 10 nm4 at a spatial frequency of not less than 1 μm−1.

摘要翻译： 公开了一种用于光刻的掩模空白基板，其中形成基板的转印图案的主表面具有通过测量1μm×1的面积获得的不大于0.15nm的均方根粗糙度（Rms） 具有原子力显微镜，并且在不小于1μm-1的空间频率下具有不大于10nm 4的功率谱密度。

公开(公告)号：US20160306271A1

公开(公告)日：2016-10-20

申请号：US15137954

申请日：2016-04-25

申请人： SHIN-ETSU CHEMICAL CO., LTD.

发明人： Shigeru Maida ,  Hisatoshi Otsuka

IPC分类号： G03F1/24 ,  C03C3/06 ,  C03B19/14

CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/81 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/42 ,  Y02P40/57

摘要： Titania-doped quartz glass is manufactured by mixing a silicon-providing reactant gas and a titanium-providing reactant gas, preheating the reactant gas mixture at 200-400° C., and subjecting the mixture to oxidation or flame hydrolysis. A substrate of the glass is free of concave defects having a volume of at least 30,000 nm3 in an effective region of the EUV light-reflecting surface and is suited for use in the EUV lithography.