公开(公告)号：US11914292B2

公开(公告)日：2024-02-27

申请号：US17308055

申请日：2021-05-05

Applicant: eChem Solutions Corp.

Inventor： Ya-Qian Chen ,  Yu-Chun Chen

IPC: G03F7/029 ,  G02F1/1335 ,  G03F7/031

CPC classification number: G03F7/029 ,  G02F1/133614 ,  G03F7/031

Abstract: The photosensitive resin composition includes an alkali-soluble resin (A), an ethylenically-unsaturated monomer (B), a photopolymerization initiator (C), a solvent (D), and a pigment (E). The alkali- soluble resin (A) includes an alkali-soluble resin (A-1), wherein the alkali-soluble resin (A-1) includes a structural unit represented by formula (I-1) and a structural unit represented by formula (I-2). The photopolymerization initiator (C) includes an acylphosphine oxide compound represented by formula (III-1).

公开(公告)号：US20210382389A1

公开(公告)日：2021-12-09

申请号：US17308055

申请日：2021-05-05

Applicant: eChem Solutions Corp.

Inventor： Ya-Qian Chen ,  Yu-Chun Chen

IPC: G03F7/029 ,  G03F7/031 ,  G02F1/1335

Abstract: A photosensitive resin composition for a development process, a spacer, a light conversion layer, and a light-emitting device are provided. The photosensitive resin composition includes an alkali-soluble resin (A), an ethylenically-unsaturated monomer (B), a photopolymerization initiator (C), a solvent (D), and a pigment (E). The alkali-soluble resin (A) includes an alkali-soluble resin (A-1), wherein the alkali-soluble resin (A-1) includes a structural unit represented by formula (I-1) and a structural unit represented by formula (I-2). The photopolymerization initiator (C) includes an acylphosphine oxide compound represented by formula (III-1).