公开(公告)号：US07191787B1

公开(公告)日：2007-03-20

申请号：US10357664

申请日：2003-02-03

申请人： Fred C. Redeker ,  John M. Boyd ,  John Parks

发明人： Fred C. Redeker ,  John M. Boyd ,  John Parks

IPC分类号： B06B3/12

CPC分类号： B08B3/12 ,  B08B7/0021 ,  H01L21/67057 ,  Y10S134/902

摘要： An apparatus and a method is provided for using high-frequency acoustic energy with a supercritical fluid to perform a semiconductor wafer (“wafer”) cleaning process. High-frequency acoustic energy is applied to the supercritical fluid to impart energy to particulate contamination present on the wafer surface. Energy imparted to particulate contamination via the high-frequency acoustic energy and supercritical fluid is used to dislodge and remove the particulate contamination from the wafer. Additionally, the wafer cleaning process benefits from the supercritical fluid properties of near zero surface tension, high diffusivity, high density, and chemical mixing capability.

摘要翻译： 提供了一种使用高频声能与超临界流体来执行半导体晶片（“晶片”）清洁工艺的装置和方法。 高频声能被施加到超临界流体以赋予存在于晶片表面上的颗粒污染物的能量。 通过高频声能和超临界流体赋予颗粒污染物的能量被用来移除和去除晶片上的颗粒污染物。 此外，晶片清洗过程受益于近零表面张力，高扩散性，高密度和化学混合能力的超临界流体性质。

公开(公告)号：US5403555A

公开(公告)日：1995-04-04

申请号：US131469

申请日：1993-10-04

申请人： Pius Steinhauser ,  Anton Bodenmiller ,  Herbert Lott

发明人： Pius Steinhauser ,  Anton Bodenmiller ,  Herbert Lott

IPC分类号： A61B19/00 ,  A61C19/00 ,  B06B1/00 ,  A61L2/02 ,  B06B3/12

CPC分类号： A61C19/002

摘要： In a device for selectively cleaning, disinfecting and maintaining medical or dental instruments, particularly tool holders, with a washing container to accommodate at least one instrument and with an ultrasonic cleaning device with an ultrasonic exciter which is arranged on the washing container, the washing container has a cross-sectional shape, preferably a horizontal cross-sectional shape, which deviates from a rectangular or square cross-sectional shape.

摘要翻译： 在用于选择性地清洁，消毒和维护医疗或牙科器械，特别是工具保持器的装置中，具有用于容纳至少一个器械的洗涤容器和具有设置在洗涤容器上的超声波激发器的超声波清洗装置，洗涤容器 具有偏离矩形或正方形横截面形状的横截面形状，优选水平横截面形状。