公开(公告)号：US20020042531A1

公开(公告)日：2002-04-11

申请号：US09977364

申请日：2001-10-16

申请人： WAKO PURE CHEMICAL INDUSTRIES, LTD.

发明人： Motoshige Sumino

IPC分类号： C07F007/04 ,  C07C057/26 ,  C07C059/46

CPC分类号： C07C69/708 ,  C07C69/734 ,  C07D317/30 ,  C07D319/06 ,  C07D319/08 ,  C08F32/08 ,  C08G61/04 ,  G03F7/039

摘要： This invention relates to a monomer shown by the general formula null1null 1 (wherein Xnull is a cyclic hydrocarbon residue containing polymerizable double bond(s), which may have a substituent, Z is a spacer or a direct bond and R is a substituted alkyl or alkenyl group having one or two protected hydroxyl groups as substituent) and a polymer containing a segment derived from the above monomer. The said polymer is useful for a resist composition, etc. utilized in the production of semiconductor elements, etc. and the said monomer is useful as a starting material for the polymer, and a resist composition using the said polymer can remarkably advantageously be used as a resist material for ArF excimer laser beams which has been considered to be a valuable technology for exposure belonging to the coming generation.

摘要翻译： 本发明涉及由通式[1]表示的单体（其中X'为含有可聚合双键的环状烃残基，可以具有取代基，Z为间隔基或直接键，R为取代基 具有一个或两个保护的羟基作为取代基的烷基或烯基）和含有源自上述单体的链段的聚合物。 所述聚合物可用于制备半导体元件等中使用的抗蚀剂组合物等，并且所述单体可用作聚合物的起始材料，并且使用所述聚合物的抗蚀剂组合物可显着有利地用作 用于ArF准分子激光束的抗蚀材料，被认为是属于下一代的有意义的曝光技术。

公开(公告)号：US20010020040A1

公开(公告)日：2001-09-06

申请号：US09730536

申请日：2000-12-07

发明人： Ezio Bombardelli ,  Paolo Morazzoni

IPC分类号： A61K035/78 ,  A61K031/22 ,  C07C053/134 ,  C07C057/26

CPC分类号： A61K31/122 ,  C07C69/013 ,  C07C69/734 ,  C07C69/92

摘要： The invention relates to compounds of the formula: 1 in which R is a saturated or unsaturated, straight or branched, C1-C22 acyl group, optionally having one or more substituents, which can be the same or different, selected from halogen atoms, nitro, amino, C1-C6-alkylamino, di-C1-C6-alkylamino, C1-C6-acylamino groups; a cycloaliphatic or aromatic acyl residue in which the aromatic moiety optionally has one or more substituents, which can be the same or different, selected from halogen atoms, hydroxy, methoxy, amino groups; a glycidic residue in which one or more hydroxy groups are optionally alkylated or acylated. The invention further relates to methods for extracting and extracts of these compounds from Hypericum perforatum as well as their use as active ingredients in antidepression medication.

摘要翻译： 本发明涉及下式的化合物：其中R是饱和或不饱和的直链或支链C 1 -C 22酰基，任选具有一个或多个可以相同或不同的取代基，可以选自卤素原子，硝基， 氨基，C 1 -C 6烷基氨基，二-C 1 -C 6烷基氨基，C 1 -C 6酰基氨基; 芳族部分任选具有一个或多个选自卤素原子，羟基，甲氧基，氨基中的相同或不同的取代基的脂环族或芳族酰基残基; 其中一个或多个羟基任选被烷基化或酰化的缩水甘油基残基。 本发明还涉及从贯叶连翘提取和提取这些化合物的方法以及它们作为抗抑郁药物中的活性成分的用途。