公开(公告)号：US06229049B1

公开(公告)日：2001-05-08

申请号：US09488746

申请日：2000-01-21

申请人： Sunao Takeda ,  Yasushi Kaneko ,  Hiromichi Eto ,  Susumu Sato

发明人： Sunao Takeda ,  Yasushi Kaneko ,  Hiromichi Eto ,  Susumu Sato

IPC分类号： C07C31914

CPC分类号： C07C319/20 ,  C07C323/22

摘要： The invention relates to a process for preparing a difluoroacetophenone derivative (4) by alkylthionating a compound (1) into a compound (2) and reacting this compound with a compound (3). wherein X1 is Cl, Br or I, X2 and X3 are independently a halogen atom, H or perfluoroalkyl group, X4 is a halogen atom, R1 is an alkyl, aryl or aralkyl group, and R2 is methyl, ethyl or cyclopropyl group.

摘要翻译： 本发明涉及通过将化合物（1）烷基化成化合物（2）并使该化合物与化合物（3）反应制备二氟苯乙酮衍生物（4）的方法，其中X1为Cl，Br或I，X2和X3 独立地为卤素原子，H或全氟烷基，X4为卤素原子，R1为烷基，芳基或芳烷基，R2为甲基，乙基或环丙基。

公开(公告)号：US06235942B1

公开(公告)日：2001-05-22

申请号：US09117372

申请日：1998-10-28

申请人： Virginie Pevere ,  Alain Gadras ,  Susan Mary Cramp ,  Charles Walter Ellwood

发明人： Virginie Pevere ,  Alain Gadras ,  Susan Mary Cramp ,  Charles Walter Ellwood

IPC分类号： C07C31914

CPC分类号： C07C205/11 ,  C07C205/45 ,  C07C319/20 ,  C07C2601/02 ,  C07C323/22

摘要： A process for preparing compounds of the formula: wherein R2 is lower alkyl; or phenyl optionally substituted by from one to five groups, the same or different, which are lower alkyl, lower haloalkyl, halogen or —SR4; R3 is halogen, lower alkyl, lower haloalkyl, lower alkoxy, lower haloalkoxy, —S-alkyl, cycloalkyl having from 3 to 7 carbon atoms in the ring, alkenyl or alkynyl having from 3 to 7 carbon atoms, or -(CR5R6)—SR2 wherein q is one or two; R4 is lower alkyl; R5 and R6 independently represent hydrogen, lower alkyl or lower haloalkyl; and n is zero or an integer from one to three; intermediate compounds of the formula: and processes for preparing them.

摘要翻译： 一种制备下式化合物的方法：其中R2是低级烷基; 或任选被一至五个相同或不同的基团取代的苯基，它们是低级烷基，低级卤代烷基，卤素或-SR 4; 或R 3为卤素，低级烷基，低级卤代烷基，低级烷氧基，低级卤代烷氧基，-S-烷基，环中具有3-7个碳原子的环烷基，具有3-7个碳原子的烯基或炔基，或 - （CR5R6） - 其中q是1或2; R4是低级烷基; R5和R6独立地表示氢，低级烷基或低级卤代烷基; 并且n为0或1至3的整数; 下式的中间体化合物及其制备方法。

公开(公告)号：US06225505B1

公开(公告)日：2001-05-01

申请号：US09463845

申请日：2000-02-01

申请人： Yoshikazu Kimura ,  Hidetaka Hiyoshi ,  Keiji Toriyabe ,  Nobuhide Wada

发明人： Yoshikazu Kimura ,  Hidetaka Hiyoshi ,  Keiji Toriyabe ,  Nobuhide Wada

IPC分类号： C07C31914

CPC分类号： C07C319/14 ,  C07C323/07 ,  C07C323/22 ,  C07C323/56 ,  C07C323/60

摘要： The present invention lies in a process for producing a trifluoromethylthiomethylbenzene derivative represented by the following general formula (2): (wherein R is a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, a cyano group, a nitro group, or a benzoyl group which may be substituted with halogen atom, alkyl group, alkoxy group, aliphatic or aromatic acyl group, nitro group, cyano group or alkoxycarbonyl group; n is an integer of 1 to 5; when n is an integer of 2 or more, a plurality of R's may be the same of each independently different), which process comprises reacting, in acetonitrile, a benzyl halide derivative represented by the following general formula (1): (wherein R and n have the same definitions as given above; and X is a halogen atom, an alkylsulfonyloxy group or an arylsulfonyloxy group which may be substituted with alkyl group or halogen atom) with thiophosgene and potassium fluoride.

摘要翻译： 本发明在于制备由以下通式（2）表示的三氟甲硫基甲基苯衍生物的方法：其中R是氢原子，卤素原子，烷基，烷氧基，烷氧基羰基，氰基， 硝基或可被卤素原子，烷基，烷氧基，脂肪族或芳香族酰基，硝基，氰基或烷氧基羰基取代的苯甲酰基，n为1〜5的整数，n为1〜5的整数， 2个以上的整数，多个R可以各自独立地不同），该方法包括在乙腈中使由以下通式（1）表示的苄基卤衍生物:(其中R和n具有相同的 定义如上所述; X为卤素原子，烷基磺酰氧基或可被烷基或卤原子取代的芳基磺酰氧基）与硫光气和氟化钾反应。