公开(公告)号：US06672739B1

公开(公告)日：2004-01-06

申请号：US09386017

申请日：1999-08-30

申请人： Bernell Edwin Argyle ,  Jeffery Gregory McCord

发明人： Bernell Edwin Argyle ,  Jeffery Gregory McCord

IPC分类号： F21K2706

CPC分类号： G02B27/0994 ,  G02B19/0028 ,  G02B19/0052 ,  G02B19/0095 ,  Y10S385/901 ,  Y10S977/887 ,  Y10S977/951

摘要： An apparatus, system, and method for illuminating a lithographic mask or an object in a microscope is presented, whereby the output of a laser beam homogenizer is imaged on to a field such as the object plane for lithographic application or on to the rear focal plane of an epi illuminating objective lens as a source for wide field illumination at an object plane in a microscope (for application to magnified imaging of weak phase objects)., and the image of the output is dithered with respect to the field

摘要翻译： 提出了一种用于在显微镜中照射光刻掩模或物体的装置，系统和方法，由此将激光束均化器的输出成像到诸如用于光刻应用的物平面的场上或在后焦平面上 作为在显微镜中的物平面处的宽场照明源（用于弱相物体的放大成像）的外延照明物镜的输出的图像相对于场的抖动