公开(公告)号：US20030093917A1

公开(公告)日：2003-05-22

申请号：US10301322

申请日：2002-11-21

发明人： Gerald N. DiBello

IPC分类号： F26B005/00 ,  F26B021/00 ,  F26B021/14 ,  F26B021/06

CPC分类号： H01L21/02052 ,  B08B3/08

摘要： Methods and apparatus for processing an electronic component precursor comprising the steps of contacting a carrier gas with a process chemical stream to entrain the process chemical in the carrier gas thereby forming a fluid stream and injecting at least a portion of additional process chemical into the fluid stream to form a localized region of increased concentration of process fluid is provided. The methods and apparatus also provide injecting a portion of additional carrier gas into the fluid stream to form a diluted region of decreased concentration of process fluid is also provided. The methods and apparatus further provide controlling the concentration of process chemical in the localized region as well as in the fluid stream. Apparatus comprising a first manifold operatively associated with a carrier gas source for receiving a fluid stream formed by the carrier gas and a second manifold in fluid communication with the first manifold for receiving a process chemical and for injecting the process chemical into the fluid stream thereby forming a localized region of increased concentration of process chemical is provided.

摘要翻译： 用于处理电子部件前体的方法和装置包括以下步骤：使载气与工艺化学品流接触，以将工艺化学品夹带在载体气体中，从而形成流体流，并将至少一部分其它工艺化学品注入流体流 以形成加工流体浓度增加的局部区域。 所述方法和装置还提供将一部分额外的载气注入流体流以形成浓缩过程流体浓度降低的稀释区域。 所述方法和装置进一步提供控制局部区域以及流体流中过程化学品的浓度。 装置，包括与载气源接合的第一歧管，用于接纳由载气形成的流体流，以及与第一歧管流体连通的第二歧管，用于接收过程化学物质，并将过程化学品注入流体流中，从而形成 提供了加工化学品浓度增加的局部区域。