公开(公告)号：US07561269B2

公开(公告)日：2009-07-14

申请号：US11956751

申请日：2007-12-14

申请人： Sanjeev Kaushal ,  Sairam Sankaranarayanan ,  Kenji Sugishima

发明人： Sanjeev Kaushal ,  Sairam Sankaranarayanan ,  Kenji Sugishima

IPC分类号： G01N21/00 ,  G01B11/00 ,  G01B21/88

CPC分类号： G01N21/95607

摘要： An optical measurement system and wafer processing tool for correcting systematic errors in which a first diffraction spectrum is measured from a standard substrate including a layer having a known refractive index and a known extinction coefficient by exposing the standard substrate to a spectrum of electromagnetic energy. A tool-perfect diffraction spectrum is calculated for the standard substrate. A hardware systematic error is calculated by comparing the measured diffraction spectrum to the calculated tool-perfect diffraction spectrum. A second diffraction spectrum from a workpiece is measured by exposing the workpiece to the spectrum of electromagnetic energy, and the measured second diffraction spectrum is corrected based on the calculated hardware systematic error to obtain a corrected diffraction spectrum.

摘要翻译： 一种用于校正系统误差的光学测量系统和晶片处理工具，其中通过将标准衬底暴露于电磁能谱，从包括具有已知折射率和已知消光系数的层的标准衬底测量第一衍射光谱。 计算标准底物的工具完美衍射光谱。 通过将测量的衍射光谱与计算的工具完美衍射光谱进行比较来计算硬件系统误差。 通过将工件暴露于电磁能的频谱来测量来自工件的第二衍射光谱，并且基于所计算的硬件系统误差来校正所测量的第二衍射光谱，以获得校正的衍射光谱。