公开(公告)号：US06246053B1

公开(公告)日：2001-06-12

申请号：US09273785

申请日：1999-03-22

申请人： Rodney Arthur Kendall ,  Gary J. Johnson ,  David J. Pinckney

发明人： Rodney Arthur Kendall ,  Gary J. Johnson ,  David J. Pinckney

IPC分类号： H01J27304

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/703 ,  G03F9/7053 ,  H01J37/304 ,  H01J2237/21 ,  H01J2237/3175

摘要： In a particle beam lithography system, focus adjustment is controlled by a measurement of the gap between the workpiece being processed and a reference surface, such as the bottom surface of the focus lens, using a pair of capacitive sensors mounted on an arm that rotates to place one sensor on the beam axis to measure the workpiece height and the other displaced from the beam aperture to measure the height of the reference surface. The sum of the two readings is constant (for a given gap dimension), so that the accuracy of the measurement is not affected by the position of the arm within the gap.

摘要翻译： 在粒子束光刻系统中，通过使用安装在臂上的一对电容传感器来测量被处理的工件之间的间隙和诸如焦点透镜的底面的参考表面之间的间隙来控制焦点调节。 将一个传感器放置在光束轴上以测量工件高度，另一个传感器从光束孔径移位，以测量参考表面的高度。 两个读数的总和是恒定的（对于给定的间隙尺寸），使得测量的精度不受臂在间隙内的位置的影响。