Stacked local interconnect structure and method of fabricating same

    公开(公告)号:US06858525B2

    公开(公告)日:2005-02-22

    申请号:US10407957

    申请日:2003-04-04

    申请人: Jigish D. Trivedi

    发明人: Jigish D. Trivedi

    摘要: A method is provided for forming stacked local interconnects that do not extend into higher levels within a multilevel IC device, thereby economizing space available within the IC device and increasing design flexibility. In a first embodiment, the method of the present invention provides a stacked local interconnect which electrically connects a first group of interconnected electrical features with one or more additional isolated groups of interconnected electrical features or one or more isolated individual electrical features. In a second embodiment, the method of the present invention provides a stacked local interconnect which electrically connects an individual electrical feature to one or more additional isolated electrical features.