公开(公告)号：WO2022258371A1

公开(公告)日：2022-12-15

申请号：PCT/EP2022/064102

申请日：2022-05-24

Applicant: ASML NETHERLANDS B.V.

Inventor： CHENG, Rui ,  ADAMS, Joshua ,  BIJNEN, Franciscus, Godefridus, Casper ,  CATEY, Eric, Brian ,  AARTS, Igor, Matheus, Petronella

IPC: G03F9/00

Abstract: Systems, apparatuses, and methods are provided for correcting the detected positions of alignment marks disposed on a substrate and aligning the substrate using the corrected data to accurately expose patterns on the substrate. An example method can include receiving a measurement signal including a combined intensity signal corresponding to first and second diffracted light beams diffracted from first and second alignment targets having different orientations. The example method can further include fitting the combined intensity signal using templates to determine weight values and determining, based on the templates and weight values, first and second intensity sub-signals corresponding to the first and second diffracted light beams. The method can further include determining first and second intensity imbalance signals based on the first and second intensity sub-signals and determining a set of corrections to the measurement signal based on the first and second intensity imbalance signals.

公开(公告)号：WO2018046279A1

公开(公告)日：2018-03-15

申请号：PCT/EP2017/070895

申请日：2017-08-18

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： VIOLETTE, Kevin J. ,  AARTS, Igor, Matheus, Petronella ,  KOK, Haico, Victor ,  CATEY, Eric, Brian

IPC: G03F9/00 ,  G03F7/20

Abstract: A method, including printing an apparatus mark onto a structure while at least partly within an apparatus. The structure is part of, or is located on, a substrate table, but is separate from a substrate to be held by the apparatus. Measuring the apparatus mark using a sensor system within the apparatus.

Abstract translation: 包括将装置标记印刷到结构上同时至少部分在装置内的方法。 该结构是衬底台的一部分或位于衬底台上，但与待由该装置保持的衬底分离。 使用设备内的传感器系统测量设备标记。