公开(公告)号：WO2019115218A1

公开(公告)日：2019-06-20

申请号：PCT/EP2018/082670

申请日：2018-11-27

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： BROUNS, Derk, Servatius, Gertruda ,  ADAMS, Joshua ,  BENDIKSEN, Aage ,  JACOBS, Richard ,  JUDGE, Andrew ,  KOTTAPALLI, Veera, Venkata, Narasimha, Narendra, Phani ,  LYONS, Joseph, Harry ,  MODDERMAN, Theodorus, Marinus ,  RANJAN, Manish ,  VAN DE KERKHOF, Marcus, Adrianus ,  XIONG, Xugang

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

Abstract: An apparatus for determining a condition associated with a pellicle (19) for use in a lithographic apparatus (LA), the apparatus comprising a sensor (26, 32, 52, 60), wherein the sensor (26, 32, 52, 60) is configured to measure a property associated with the pellicle (19), the property being indicative of the pellicle condition.

公开(公告)号：WO2022258371A1

公开(公告)日：2022-12-15

申请号：PCT/EP2022/064102

申请日：2022-05-24

Applicant: ASML NETHERLANDS B.V.

Inventor： CHENG, Rui ,  ADAMS, Joshua ,  BIJNEN, Franciscus, Godefridus, Casper ,  CATEY, Eric, Brian ,  AARTS, Igor, Matheus, Petronella

IPC: G03F9/00

Abstract: Systems, apparatuses, and methods are provided for correcting the detected positions of alignment marks disposed on a substrate and aligning the substrate using the corrected data to accurately expose patterns on the substrate. An example method can include receiving a measurement signal including a combined intensity signal corresponding to first and second diffracted light beams diffracted from first and second alignment targets having different orientations. The example method can further include fitting the combined intensity signal using templates to determine weight values and determining, based on the templates and weight values, first and second intensity sub-signals corresponding to the first and second diffracted light beams. The method can further include determining first and second intensity imbalance signals based on the first and second intensity sub-signals and determining a set of corrections to the measurement signal based on the first and second intensity imbalance signals.

公开(公告)号：WO2022207395A1

公开(公告)日：2022-10-06

申请号：PCT/EP2022/057355

申请日：2022-03-21

Applicant: ASML NETHERLANDS B.V.

Inventor： ADAMS, Joshua ,  MONTILLA, Leonardo, Gabriel ,  THISSEN, Nick, Franciscus, Wilhelmus ,  KARSSEMEIJER, Leendert, Jan ,  AARTS, Igor, Matheus, Petronella ,  DASTOURI, Zahrasadat

IPC: G03F7/20 ,  G03F9/00

Abstract: Systems, apparatuses, and methods are provided for correcting the detected positions of alignment marks disposed on a substrate and aligning the substrate using the corrected data to ensure accurate exposure of one or more patterns on the substrate. An example method can include receiving measurement data indicative of an interference between light diffracted from a plurality of alignment marks disposed on a substrate or reflected from the substrate. The example method can further include determining substrate deformation data based on the measurement data. The example method can further include determining alignment mark deformation data based on the measurement data. The alignment mark deformation data can include alignment mark deformation spectral pattern data, alignment mark deformation amplitude data, and alignment mark deformation offset data. Subsequently, the example method can include determining a correction to the measurement data based on the substrate deformation data and the alignment mark deformation data.