Abstract:
A process for physical vapor deposition of a refractory coating such as titanium nitride on a nonconductive substrate such as a ceramic substrate and the coated substrate produced thereby. The nonconductive substrate is coated by cleaning the nonconductive substrate surfaces and then depositing a first layer of a refractory metal such as titanium metal on the nonconductive substrate by physical vapor deposition. A second layer of a refractory compound such as titanium nitride is then deposited on the first layer by physical vapor deposition to produce a coated nonconductive substrate having enhanced coating adhesion.
Abstract:
A cutting tool is provided composed of a hard substrate having a PVD coating thereon having three layers. The innermost of first layer (1) is composed of a group IVB (titanium, hafnium or zirconium) metal alloy. The middle or second layer (2 and 3) is composed of a group IVB carbonitride. The outermost or third layer (4) is also composed of a group IVB metal nitride. The PVD coating is characterized by high hardness and high residual compressive stresses.
Abstract:
Provided is a coated cutting tool (10) having a binder enriched substrate (18). The coating includes at least one chemical vapor deposited (CVP) layer (30) and at least one physical vapor deposited (PVD) layer (34). The PVD layer contains residual compressive stresses.
Abstract:
Provided is a coated cutting tool (10) having a coating and a substrate. The coating includes at least one chemical vapor deposited (CVD) layer and at least one physical vapor deposited (PVD) layer. The outermost layer of the coating is a PVD layer, containing residual compressive stresses. The substrate is a composite having hard refractory grains bonded together by a binder material.