公开(公告)号：WO2018022599A1

公开(公告)日：2018-02-01

申请号：PCT/US2017/043689

申请日：2017-07-25

Applicant: SMARTSKY NETWORKS LLC

Inventor： ANDERSON, Theodore R.

IPC: H05H1/46 ,  H05H1/00

CPC classification number: H01Q1/366 ,  H01Q3/44 ,  H01Q5/314 ,  H05H1/0031 ,  H05H1/46 ,  H05H2001/463 ,  H05H2001/4682

Abstract: A plasma antenna assembly includes a plasma antenna element, a plasma density sensor operably coupled to the plasma antenna element to measure plasma density during ionization of the plasma antenna element, a driver circuit operably coupled to the plasma antenna element to selectively provide pulsed current to the plasma antenna element for ionization of plasma in the plasma antenna element;, and a controller operably coupled to the driver circuit and the plasma density sensor to provide control of the plasma density of the plasma antenna element

Abstract translation: 等离子体天线组件包括等离子体天线元件，可操作地耦合到等离子体天线元件以测量等离子体天线元件的电离期间的等离子体密度的等离子体密度传感器，驱动器电路可操作地耦合到等离子体天线 用于选择性地向所述等离子体天线元件提供脉冲电流以用于所述等离子体天线元件中的等离子体的电离;以及控制器，可操作地耦合到所述驱动器电路和所述等离子体密度传感器以提供对所述等离子体天线元件的等离子体密度的控制， p>

公开(公告)号：WO2003098980A1

公开(公告)日：2003-11-27

申请号：PCT/AU2003/000615

申请日：2003-05-21

Applicant: VARIAN AUSTRALIA PTY LTD ,  HAMMER, Michael, Ron

Inventor： HAMMER, Michael, Ron

IPC: H05H1/34

CPC classification number: G01N21/73 ,  G01N22/00 ,  G01N33/18 ,  H05H1/0031 ,  H05H1/30 ,  H05H1/3405 ,  H05H1/42

Abstract: A Plasma torch (10) for microwave induced plasma spectrochemical analysis of a sample includes a nozzle (30) in an inlet (18) for the main plasma gas flow between outer tube (12) and intermediate tube (14) of the torch (10). The nozzle (30) increases the gas flow velocity in the sheathing gas layer for the plasma which is provided by the gas flow from the annular gap (22) between the tubes (12 and 14). The increased velocity of the gas in the sheathing gas layer "stiffens" that layer and thus better confines the microwave induced plasma (such better confinement not being necessary for an ICP torch). Thus the torch is of improved durability for a microwave induced plasma compared to an ICP torch. The sample injection (inner) tube (16) may have a reduced diameter outlet at its end (34) which is substantially level with the end (35) of intermediate tube (14) to improve injection of a sample into the microwave induced plasma. The inlet end (26) of the sample injection tube (16) may include a heater (36) to assist in preventing blockages in tube (16) near its outlet end.

Abstract translation: 用于样品的微波诱导等离子体光谱化学分析的等离子体手电筒（10）包括在用于主管等离子体气体流动的入口（18）中的喷嘴（30），用于在外管（12）和火炬（10）的中间管（14）之间 ）。 喷嘴（30）增加了由来自管（12和14）之间的环形间隙（22）的气流提供的等离子体的护套气层中的气体流速。 护层气体层中气体的增加速度“加固”该层，从而更好地限制了微波诱导的等离子体（这种更好的限制对于ICP焊炬来说不是必需的）。 因此，与ICP焊枪相比，手电筒具有改善的微波感应等离子体的耐久性。 样品注入（内）管（16）可以在其端部（34）处具有减小直径的出口，该出口基本上与中间管（14）的端部（35）平齐，以改进将样品注入到微波感应等离子体中。 样品注入管（16）的入口端（26）可以包括加热器（36），以帮助防止在其出口端附近的管（16）中的堵塞。

公开(公告)号：WO1997024019A1

公开(公告)日：1997-07-03

申请号：PCT/FR1996002045

申请日：1996-12-20

Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ,  ELOY, Jean-François

Inventor： COMMISSARIAT A L'ENERGIE ATOMIQUE

IPC: H05H01/00

CPC classification number: H05G2/001 ,  H05H1/0031

Abstract: An interferometric device for characterising a medium (24), comprising means (2, 6, 8, 12, 14) for generating a radiation pulse train at a repetition rate higher than 10 Hz, means for aiming a pump beam (28) at the medium to be measured which responds by producing a signal beam (32), sensing means (26) for receiving the signal beam, means (14) for aiming a probe beam (30) at the sensing means (26), means (34) for sampling an incident signal on the sensor (26) resulting from the interference between the signal beam (32) from the medium and the probe beam (30), and means (44-1, 44-2, ...) for varying the time at which the sampling means are actuated.

Abstract translation: 一种用于表征介质（24）的干涉仪，包括用于以高于10Hz的重复频率产生辐射脉冲串的装置（2,6,8,12,14），用于将泵浦光束（28 ）通过产生信号光束（32）进行响应的待测介质，用于接收信号光束的感测装置（26），用于将探测光束（30）瞄准感测装置（26）的装置（14） （34），用于对来自介质的信号光束（32）与探测光束（30）之间的干涉导致的传感器（26）上的入射信号进行采样;以及装置（44-1,44-2，...） ），用于改变采样装置被致动的时间。