公开(公告)号：WO2004104698A2

公开(公告)日：2004-12-02

申请号：PCT/US2004/015531

申请日：2004-05-18

Applicant: APPLIED MATERIALS, INC. ,  NGUYEN, Son, Van ,  ARMACOST, Michael, D. ,  NAIK, Mehul ,  DIXIT, Girish, A. ,  YIEH, Ellie, Y.

Inventor： NGUYEN, Son, Van ,  ARMACOST, Michael, D. ,  NAIK, Mehul ,  DIXIT, Girish, A. ,  YIEH, Ellie, Y.

IPC: G03F

CPC classification number: G03F7/091 ,  G03F7/11 ,  H01L21/0276 ,  H01L21/31144 ,  H01L21/76808 ,  H01L21/7681 ,  H01L21/76826 ,  H01L21/76834 ,  H01L21/76835

Abstract: Methods are provided for depositing a dielectric material for use as an anti-reflective coating and sacrificial dielectric material in damascene formation. In one aspect, a process is provided for processing a substrate including depositing an acidic dielectric layer on the substrate by reacting an oxygen-containing organosilicon compound and an acidic compound, depositing a photoresist material on the acidic dielectric layer, and patterning the photoresist layer. The acidic dielectric layer may be used as a sacrificial layer in forming a feature definition by etching a partial feature definition, depositing the acidic dielectric material, etching the remainder of the feature definition, and then removing the acidic dielectric material to form a feature definition.

Abstract translation: 提供了用于沉积电介质材料的方法，用作抗镶嵌层中的抗反射涂层和牺牲电介质材料。 在一个方面，提供了一种处理衬底的方法，包括通过使含氧有机硅化合物和酸性化合物反应，在酸性电介质层上沉积光致抗蚀剂材料，并使光致抗蚀剂层图形化，在衬底上沉积酸性介电层。 通过蚀刻部分特征定义，沉积酸性电介质材料，蚀刻特征定义的其余部分，然后除去酸性介电材料以形成特征定义，酸性介电层可用作形成特征定义的牺牲层。

公开(公告)号：WO2004082010A3

公开(公告)日：2004-09-23

申请号：PCT/US2004/006849

申请日：2004-03-05

Applicant: APPLIED MATERIALS INC. ,  SCHMITT, Francimar, C. ,  XIA, Li-Qun ,  NGUYEN, Son Van ,  VENKATARAMAN, Shankar

Inventor： SCHMITT, Francimar, C. ,  XIA, Li-Qun ,  NGUYEN, Son Van ,  VENKATARAMAN, Shankar

IPC: H01L21/31

Abstract: Methods are provided for processing a substrate for depositing an adhesion layer having a low dielectric constant between two low k dielectric layers. In one aspect, the invention provides a method for processing a substrate including depositing a barrier layer (112) on the substrate, wherein the barrier layer comprises silicon and carbon and has a dielectric constant less than 4, depositing a dielectric initiation layer adjacent the barrier layer, and depositing a first dielectric layer (110) adjacent the dielectric initiation layer, wherein the dielectric layer comprises silicon, oxygen, and carbon and has a dielectric constant of about 3 or less.

公开(公告)号：WO2003021251A1

公开(公告)日：2003-03-13

申请号：PCT/US2002/027629

申请日：2002-08-28

Applicant: SYMYX TECHNOLOGIES, INC. ,  PETRO, Miroslav ,  NGUYEN, Son, Hoai ,  CARLSON, Eric, D.

Inventor： PETRO, Miroslav ,  NGUYEN, Son, Hoai ,  CARLSON, Eric, D.

IPC: G01N30/88

CPC classification number: G01N30/463 ,  B01D15/1878 ,  B01D15/265 ,  B01D15/325 ,  B01D15/34 ,  B01D15/424 ,  B01J19/0046 ,  B01J2219/00283 ,  B01J2219/00286 ,  B01J2219/00308 ,  B01J2219/00315 ,  B01J2219/00317 ,  B01J2219/00389 ,  B01J2219/00585 ,  B01J2219/00599 ,  B01J2219/00689 ,  B01J2219/00691 ,  B01J2219/00695 ,  B01J2219/00704 ,  B01J2219/00707 ,  B01J2219/00722 ,  B01J2219/00725 ,  B01J2219/00731 ,  B01J2219/00736 ,  G01N30/02 ,  G01N30/20 ,  G01N30/46 ,  G01N30/461 ,  G01N30/8651 ,  G01N33/44 ,  G01N2030/027 ,  G01N2030/324 ,  G01N30/16

Abstract: Methods and apparatus for characterizing a polymer sample and in preferred embodiments, libraries of polymer samples, in a comprehensive, directly-coupled multi-dimensional liquid chromatography system are disclosed. The first and second dimensions are preferably high-performance liquid chromatography dimensions, such as for example, a first dimension adapted for determining composition e.g. adapted for mobile-phase gradient elution chromatography, including reverse phase chromatography, adsorption chromatography and the like), and a second dimension adapted for determining molecular weight or particle size (e.g., adapted for size exclusion chromatography, including gel permeation chromatography).

Abstract translation: 公开了在全面的直接偶联的多维液相色谱系统中表征聚合物样品并且在优选实施方案中表征聚合物样品的文库的方法和装置。 第一和第二尺寸优选为高效液相色谱法尺寸，例如适合于确定组合物的第一尺寸，例如， 适用于流动相梯度洗脱色谱法，包括反相色谱法，吸附色谱法等）和适用于确定分子量或粒度（例如，适用于尺寸排阻色谱法，包括凝胶渗透色谱法）的第二维度。 p>