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公开(公告)号：WO2020023854A1
公开(公告)日：2020-01-30
申请号：PCT/US2019/043626
申请日：2019-07-26
Applicant: APPLIED MATERIALS, INC.
Inventor： LEE, Jared , BALUJA, Sanjeev , AUBUCHON, Joseph , KASHYAP, Dhritiman Subha , RICE, Michael
IPC: C23C16/455
Abstract: Apparatus and methods for providing high velocity gas flow showerheads for deposition chambers are described. The showerhead has a faceplate in contact with a backing plate that has a concave portion to provide a plenum between the backing plate and the faceplate. A plurality of thermal elements is within the concave portion of the backing plate and extends to contact the faceplate.
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