公开(公告)号：WO2019243009A1

公开(公告)日：2019-12-26

申请号：PCT/EP2019/063895

申请日：2019-05-29

Applicant: ASML NETHERLANDS B.V.

Inventor： NASALEVICH, Maxim, Aleksandrovich ,  KLEIN, Alexander, Ludwig ,  KURGANOVA, Evgenia ,  NOTENBOOM, Arnoud, Willem ,  VAN ZWOL, Pieter-Jan ,  VLES, David, Ferdinand

IPC: G03F1/62 ,  G03F1/22 ,  G03F7/20

Abstract: A pellicle comprising a core comprising a material other than silicon carbide, a silicon carbide adhesion layer, and a ruthenium capping layer, the ruthenium capping layer being in contact with the silicon carbide adhesion layer. Also described is a method of preparing a pellicle comprising the steps of: (i) providing a pellicle core; (ii) providing a silicon carbide adhesion layer on the pellicle core; and (iii) providing a ruthenium capping layer in contact with the silicon carbide adhesion layer. Also provided is the use of silicon carbide as an adhesion layer in an EUV pellicle as well as an assembly.

公开(公告)号：WO2019086643A1

公开(公告)日：2019-05-09

申请号：PCT/EP2018/080075

申请日：2018-11-05

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN ZWOL, Pieter-Jan ,  GIESBERS, Adrianus, Johannes, Maria ,  KLOOTWIJK, Johan, Hendrik ,  KURGANOVA, Evgenia ,  NASALEVICH, Maxim, Aleksandrovich ,  NOTENBOOM, Arnoud, Willem ,  PÉTER, Mária ,  SJMAENOK, Leonid, Aizikovitsj ,  VAN DER WOORD, Ties, Wouter ,  VLES, David, Ferdinand

IPC: G03F1/62

Abstract: A pellicle for a lithographic apparatus, wherein the pellicle comprises nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus comprising at least one compensating layer selected and configured to counteract changes in the transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.