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公开(公告)号：WO2020099072A1
公开(公告)日：2020-05-22
申请号：PCT/EP2019/078655
申请日：2019-10-22
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN ZWOL, Pieter-Jan , DONMEZ, Inci , GIESBERS, Adrianus, Johannes, Maria , HOUWELING, Zomer, Silvester , KLEIN, Alexander, Ludwig , KLOOTWIJK, Johan, Hendrik , KURGANOVA, Evgenia , NOTENBOOM, Arnoud, Willem , SI, Fai Tong , VAN DER WOORD, Ties, Wouter , VAN KRAAIJ, Markus, Gerardus, Martinus, Maria
Abstract: A pellicle for EUV lithography comprising: a frame; and a membrane supported by the frame, wherein the membrane comprises: a metallic or semimetallic layer, wherein the membrane comprises pores at a density of at least 5 per µm 2 . The membrane may have a substrate layer for supporting the metallic or semimetallic layer, the substrate layer comprising for example silicon obtained from silicon on insulator or polysilicon.
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公开(公告)号：WO2019101517A1
公开(公告)日：2019-05-31
申请号：PCT/EP2018/080415
申请日：2018-11-07
Applicant: ASML NETHERLANDS B.V.
Inventor： NASALEVICH, Maxim, Aleksandrovich , KURGANOVA, Evgenia , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , VAN ZWOL, Pieter-Jan , VLES, David, Ferdinand
IPC: G03F7/20
Abstract: A method of manufacturing a pellicle for a lithographic apparatus, said method comprising growing the pellicle in a three-dimensional template and pellicles manufactured according to this method. Also disclosed is the use of a pellicle manufactured according to the method in an EUV lithography apparatus as well as the use of a three-dimensional template in the manufacture of a pellicle.
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公开(公告)号：WO2023066683A1
公开(公告)日：2023-04-27
申请号：PCT/EP2022/077938
申请日：2022-10-07
Applicant: ASML NETHERLANDS B.V.
Inventor： DE VRIES, Gosse, Charles , DONDERS, Sjoerd, Nicolaas, Lambertus , JANSSEN, Franciscus, Johannes, Joseph , KURGANOVA, Evgenia , WOLF, Abraham, Jan , BAKKER, Ties, Jan, Willem , HILDENBRAND, Volker, Dirk , VERMEULEN, Paul, Alexander , ENGEL, Michael , LUTTIKHUIS, Bernardus, Antonius, Johannes , VAN DER HAM, Ronald , VAN LIPZIG, Jeroen, Peterus, Johannes
Abstract: A lithographic apparatus comprises: an illumination system; a support structure; a substrate table; a projection system and a heating system. The illumination system is configured to condition a radiation beam. The support structure is constructed to support a reticle and pellicle assembly for receipt of the radiation beam conditioned by the illumination system. The substrate table is constructed to support a substrate. The projection system is configured to receive the radiation beam from the reticle - pellicle assembly and to project it onto the substrate. The heating system is operable to heat a pellicle of the reticle - pellicle assembly supported by the support structure. A method for using a reticle - pellicle assembly comprises: illuminating the reticle - pellicle assembly with a radiation beam so as to form a patterned image on a substrate; and heating the pellicle of the reticle - pellicle assembly using a separate heat source.
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公开(公告)号：WO2021175589A1
公开(公告)日：2021-09-10
申请号：PCT/EP2021/053852
申请日：2021-02-17
Applicant: STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN , UNIVERSITEIT VAN AMSTERDAM , STICHTING VU , ASML NETHERLANDS B.V.
Inventor： KURGANOVA, Evgenia , DE VRIES, Gosse, Charles , POLYAKOV, Alexey, Olegovich , OVERKAMP, Jim, Vincent , COENEN, Teis, Johan , DRUZHININA, Tamara , CASTELLANOS ORTEGA, Sonia , LUGIER, Olivier, Christian, Maurice
IPC: C23C16/04 , C23C16/26 , C23C16/455 , C23C16/46 , C23C16/48 , C23C16/56 , C23C14/04 , H01L21/02 , G03F7/004 , G03F7/16 , G03F7/36
Abstract: Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a deposition-process material is provided in gaseous form. A layer of the deposition-process material is formed on the substrate by causing condensation or deposition of the gaseous deposition-process material. A selected portion of the layer of deposition-process material is irradiated to modify the deposition-process material in the selected portion.
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5.发明申请
公开(公告)号：WO2019025082A1
公开(公告)日：2019-02-07
申请号：PCT/EP2018/067052
申请日：2018-06-26
Applicant: ASML NETHERLANDS B.V.
Inventor： KURGANOVA, Evgenia , GIESBERS, Adrianus, Johannes, Maria , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , VAN ZWOL, Pieter-Jan , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
Abstract: A method of manufacturing a pellicle for a lithographic apparatus, said method comprising: locally heating the pellicle (4) using radiative heating (3), and depositing coating material simultaneously on both sides of the pellicle. Also disclosed are pellicles manufactured according to this method. Further disclosed is the use of a multilayer graphene pellicle with double-sided hexagonal boron nitride coating in a lithographic apparatus.
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Patent Agency Ranking
公开(公告)号：WO2018228933A3
公开(公告)日：2018-12-20
申请号：PCT/EP2018/065127
申请日：2018-06-08
Applicant: ASML NETHERLANDS B.V.
Inventor： VLES, David, Ferdinand , ANDE, Chaitanya Krishna , DE GROOT, Antonius, Franciscus, Johannes , GIESBERS, Adrianus, Johannes, Maria , JANSSEN, Johannes, Joseph , JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , MEIJER, Marcel, Peter , MEIJERINK, Wouter, Rogier , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , OLSMAN, Raymond , PATEL, Hrishikesh , PÉTER, Mária , VAN DEN BOSCH, Gerrit , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Alexandar, Nikolov
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：WO2018228933A2
公开(公告)日：2018-12-20
申请号：PCT/EP2018/065127
申请日：2018-06-08
Applicant: ASML NETHERLANDS B.V.
Inventor： VLES, David, Ferdinand , ANDE, Chaitanya Krishna , DE GROOT, Antonius, Franciscus, Johannes , GIESBERS, Adrianus, Johannes, Maria , JANSSEN, Johannes, Joseph , JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , MEIJER, Marcel, Peter , MEIJERINK, Wouter, Rogier , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , OLSMAN, Raymond , PATEL, Hrishikesh , PÉTER, Mária , VAN DEN BOSCH, Gerrit , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Alexandar, Nikolov
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：WO2022106157A1
公开(公告)日：2022-05-27
申请号：PCT/EP2021/079524
申请日：2021-10-25
Applicant: ASML NETHERLANDS B.V.
Inventor： PARAYIL VENUGOPALAN, Syam , KURGANOVA, Evgenia , FARAMARZI, Vina
IPC: C23C16/04 , C23C16/48 , G03F7/004 , G03F7/16 , H01L21/02 , H01L21/027 , H01L29/739
Abstract: Methods of forming a patterned layer of material are disclosed. In one arrangement, a substrate having a layered structure is provided. The layered structure comprises a base layer, a support layer, and a thermally insulating layer between the base layer and the support layer. The support layer comprises a plurality of sub-units that are thermally insulated from each other. A selected portion of the support layer is selectively irradiated during a pattern-forming process. The irradiation locally drives the pattern-forming process to form a layer of material in a pattern defined by the selected portion.
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公开(公告)号：WO2022058111A1
公开(公告)日：2022-03-24
申请号：PCT/EP2021/072787
申请日：2021-08-17
Applicant: ASML NETHERLANDS B.V.
Inventor： KURGANOVA, Evgenia , SCOTUZZI, Marijke , FARAMARZI, Vina , VAN DEN BROEK, Bastiaan, Maurice
Abstract: Methods of performing metrology are disclosed. In one arrangement a substrate is provided that has a layer formed on the substrate. The layer comprises a two-dimensional material. A target portion of the layer is illuminated with a beam of radiation and a distribution of radiation in a pupil plane is detected to obtain measurement data. The measurement data is processed to obtain metrology information about the target portion of the layer. The illuminating, detecting and processing are performed for plural different target portions of the layer to obtain metrology information for the plural target portions of the layer.
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公开(公告)号：WO2020078721A1
公开(公告)日：2020-04-23
申请号：PCT/EP2019/076667
申请日：2019-10-02
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN ZWOL, Pieter-Jan , BALTUSSEN, Sander , DE GRAAF, Dennis , FRANKEN, Johannes, Christiaan, Leonardus , GIESBERS, Adrianus, Johannes, Maria , KLEIN, Alexander, Ludwig , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , KUZNETSOV, Alexey, Sergeevich , NOTENBOOM, Arnoud, Willem , VALEFI, Mahdiar , VAN DE KERKHOF, Marcus, Adrianus , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER WOORD, Ties, Wouter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Aleksandar, Nikolov
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising: at least one membrane layer supported by a planar substrate, wherein the planar substrate comprises an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate, wherein the step of selectively removing the inner region of the planar substrate comprises using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer; such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border comprising the border region of the planar substrate and the first sacrificial layer situated between the border and the membrane layer.
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