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公开(公告)号：WO2018041599A1
公开(公告)日：2018-03-08
申请号：PCT/EP2017/070394
申请日：2017-08-11
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DER MEULEN, Frits , ARLEMARK, Erik, Johan , COX, Hendrikus, Herman, Marie , CUIJPERS, Martinus, Agnes, Willem , DE HOOGH, Joost , DE VRIES, Gosse, Charles , DE WIT, Paul , Corné, Henri , DERKS, Sander, Catharina, Reinier , GIJZEN, Ronald, Cornelis, Gerardus , HEMSCHOOTE, Dries, Vaast, Paul , HOOGENDAM, Christiaan, Alexander , KOEVOETS, Adrianus, Hendrik , LAFARRE, Raymond, Wilhelmus, Louis , LEROUX, Alain, Louis, Claude , LIMPENS, Patrick, Willem, Paul , OVERKAMP, Jim, Vincent , VALENTIN, Christiaan, Louis , VAN BERKEL, Koos , VAN DER MEULEN, Stan, Henricus , VAN DER SANDEN, Jacobus, Cornelis, Gerardus , VAN DER SCHOOT, Harmen, Klaas , VLES, David, Ferdinand , WESTERHUIS, Evert, Auke, Rinze
IPC: G03F7/20
Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
Abstract translation: 一种光刻设备，包括投影系统，所述投影系统被配置成投影图案化的辐射束以在保持在衬底台上的衬底上形成曝光区域，所述光刻设备还包括用于冷却所述衬底的冷却设备，其中 冷却装置包括位于衬底台上方并且与暴露区域相邻的冷却元件，冷却元件被配置为从衬底去除热量。
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公开(公告)号：WO2019243009A1
公开(公告)日：2019-12-26
申请号：PCT/EP2019/063895
申请日：2019-05-29
Applicant: ASML NETHERLANDS B.V.
Inventor： NASALEVICH, Maxim, Aleksandrovich , KLEIN, Alexander, Ludwig , KURGANOVA, Evgenia , NOTENBOOM, Arnoud, Willem , VAN ZWOL, Pieter-Jan , VLES, David, Ferdinand
Abstract: A pellicle comprising a core comprising a material other than silicon carbide, a silicon carbide adhesion layer, and a ruthenium capping layer, the ruthenium capping layer being in contact with the silicon carbide adhesion layer. Also described is a method of preparing a pellicle comprising the steps of: (i) providing a pellicle core; (ii) providing a silicon carbide adhesion layer on the pellicle core; and (iii) providing a ruthenium capping layer in contact with the silicon carbide adhesion layer. Also provided is the use of silicon carbide as an adhesion layer in an EUV pellicle as well as an assembly.
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公开(公告)号：WO2019086643A1
公开(公告)日：2019-05-09
申请号：PCT/EP2018/080075
申请日：2018-11-05
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN ZWOL, Pieter-Jan , GIESBERS, Adrianus, Johannes, Maria , KLOOTWIJK, Johan, Hendrik , KURGANOVA, Evgenia , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , SJMAENOK, Leonid, Aizikovitsj , VAN DER WOORD, Ties, Wouter , VLES, David, Ferdinand
IPC: G03F1/62
Abstract: A pellicle for a lithographic apparatus, wherein the pellicle comprises nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus comprising at least one compensating layer selected and configured to counteract changes in the transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.
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公开(公告)号：WO2017182216A1
公开(公告)日：2017-10-26
申请号：PCT/EP2017/056644
申请日：2017-03-21
Applicant: ASML NETHERLANDS B.V.
Inventor： ONVLEE, Johannes , DE GROOT, Antonius, Franciscus, Johannes , SYMENS, Wim , VLES, David, Ferdinand
IPC: G03F7/20
CPC classification number: G03F7/70708 , G03F7/70691 , G03F7/707 , G03F7/70733
Abstract: The invention relates to a substrate support (WT) for supporting a substrate (W). The substrate support comprises the main body (MB), a clamping device (VC; VSO) and a dither device (DD). The main body comprises the support surface (S) for supporting the substrate (W). The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.
Abstract translation: 本发明涉及用于支撑衬底（W）的衬底支撑件（WT）。 基板支架包括主体（MB），夹紧装置（VC; VSO）和抖动装置（DD）。 主体包括用于支撑基板（W）的支撑表面（S）。 夹紧装置布置成提供夹紧力以将基底夹紧在支撑表面上。 抖动装置被配置为抖动夹紧力。 抖动装置可以被配置为在衬底W被加载到支撑表面上时抖动夹紧力。
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公开(公告)号：WO2017036944A1
公开(公告)日：2017-03-09
申请号：PCT/EP2016/070161
申请日：2016-08-26
Applicant: ASML NETHERLANDS B.V.
Inventor： HOUWELING, Zomer, Silvester , CASIMIRI, Eric, Willem, Felix , DRUZHININA, Tamara , JANSSEN, Paul , KUIJKEN, Michael, Alfred, Josephus , LEENDERS, Martinus, Hendrikus, Antonius , OOSTERHOFF, Sicco , PÉTER, Mária , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
IPC: G03F1/62
CPC classification number: G03F1/62
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
Abstract translation: 一种用于制造用于EUV光刻的膜组件的方法，所述方法包括：提供包括平面基板和至少一个膜层的堆叠，其中所述平面基板包括内部区域和围绕所述内部区域的边界区域; 将所述堆叠定位在支撑件上，使得所述平面基板的内部区域被暴露; 并且使用非液体蚀刻剂选择性地去除所述平面基板的内部区域，使得所述膜组件包括：由所述至少一个膜层形成的膜; 以及保持膜的边界，从平面基板的边界区域形成的边界。
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Patent Agency Ranking
公开(公告)号：WO2019081095A1
公开(公告)日：2019-05-02
申请号：PCT/EP2018/073095
申请日：2018-08-28
Applicant: ASML NETHERLANDS B.V.
Inventor： DUYS, Anton, Wilhelmus , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , VAN ZWOL, Pieter-Jan , VLES, David, Ferdinand
Abstract: A pellicle frame (17) for supporting a pellicle, the frame (17) comprising a first surface (17B) and a second surface (17A) opposite the first surface (17A), and structure (18) provided between the first and the second surfaces (17A, 17B); wherein the first and second surfaces (17A, 17B) and the structure (18) at least partially define at least one volume (28) therebetween that is devoid of the material that forms the frame (17).
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公开(公告)号：WO2017186486A1
公开(公告)日：2017-11-02
申请号：PCT/EP2017/058721
申请日：2017-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： NASALEVICH, Maxim, Aleksandrovich , ABEGG, Erik, Achilles , BANERJEE, Nirupam , BLAUW, Michiel, Alexander , BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KRUIZINGA, Matthias , LENDERINK, Egbert , MAXIM, Nicolae , NIKIPELOV, Andrey , NOTENBOOM, Arnoud, Willem , PILIEGO, Claudia , PÉTER, Mária , RISPENS, Gijsbert , SCHUH, Nadja , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBURG, Antonius, Willem , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter , ZDRAVKOV, Alexandar, Nikolov
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
Abstract translation: 公开了用于EUV光刻的膜。 在一种布置中，膜包括具有以下顺序的层的堆叠体：包含第一金属的氧化物的第一封盖层; 基层，其包含含有第二金属和选自Si，B，C和N的附加元素的化合物; 以及包含第三金属的氧化物的第二覆盖层，其中第一金属不同于第二金属，第三金属与第一金属相同或不同。
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公开(公告)号：WO2017102379A1
公开(公告)日：2017-06-22
申请号：PCT/EP2016/079594
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN ZWOL, Pieter-Jan , DE GRAAF, Dennis , JANSSEN, Paul , PÉTER, Mária , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
CPC classification number: G03F1/24 , G03F1/62 , G03F7/70916 , G03F7/70983
Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and comprising a stack comprising: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine
Abstract translation: 一种用于EUV光刻的膜，所述膜具有不大于200nm的厚度并且包括叠层，所述叠层包括：至少一个硅层; 以及至少一个由硅化合物和选自由硼，磷，溴组成的组中的元素构成的硅化合物层，
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9.发明申请
公开(公告)号：WO2017067813A2
公开(公告)日：2017-04-27
申请号：PCT/EP2016/074280
申请日：2016-10-11
Applicant: ASML NETHERLANDS B.V.
Inventor： PÉTER, Mária , ABEGG, Erik, Achilles , GIESBERS, Adrianus, Johannes, Maria , KLOOTWIJK, Johan, Hendrik , NASALEVICH, Maxim, Aleksandrovich , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
IPC: G03F7/20
CPC classification number: G03F7/70958 , G03F1/62 , G03F7/70983 , G21K2201/067
Abstract: Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer on a planar surface of a substrate. The substrate comprises a first substrate portion and a second substrate portion. The method further comprises removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
Abstract translation: 公开了制造用于光刻设备的防护薄膜组件的方法。 在一种布置中，该方法包括在衬底的平坦表面上沉积至少一个石墨烯层。 衬底包括第一衬底部分和第二衬底部分。 该方法还包括去除第一衬底部分以从至少一个石墨烯层形成独立式膜。 独立膜由第二基底部分支撑。
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公开(公告)号：WO2020109152A1
公开(公告)日：2020-06-04
申请号：PCT/EP2019/082184
申请日：2019-11-22
Applicant: ASML NETHERLANDS B.V.
Inventor： NIKIPELOV, Andrey , KURILOVICH, Dmitry , SBRIZZAI, Fabio , VAN DE KERKHOF, Marcus, Adrianus , VAN DER WOORD, Ties, Wouter , VAN DER ZANDE, Willem, Joan , VAN DUIVENBODE, Jeroen , VLES, David, Ferdinand
Abstract: A membrane cleaning apparatus for removing particles from a membrane comprises: a membrane support; and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may comprise: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.
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