METAL OXIDE TFT WITH IMPROVED STABILITY
    11.
    发明申请
    METAL OXIDE TFT WITH IMPROVED STABILITY 审中-公开
    金属氧化物膜具有改进的稳定性

    公开(公告)号:WO2012057903A1

    公开(公告)日:2012-05-03

    申请号:PCT/US2011/047768

    申请日:2011-08-15

    CPC classification number: H01L29/7869 H01L29/78696

    Abstract: A metal oxide semiconductor device including an active layer of metal oxide, a layer of gate dielectric, and a layer of low trap density material. The layer of low trap density material is sandwiched between the active layer of metal oxide and the layer of gate dielectric. The layer of low trap density material has a major surface parallel and in contact with a major surface of the active layer of metal oxide to form a low trap density interface with the active layer of metal oxide. A second layer of low trap density material can optionally be placed in contact with the opposed major surface of the active layer of metal oxide so that a low trap density interface is formed with both surfaces of the active layer of metal oxide.

    Abstract translation: 一种金属氧化物半导体器件,包括金属氧化物的有源层,栅极电介质层和低陷阱密度材料层。 低陷阱密度材料层夹在金属氧化物的有源层和栅极电介质层之间。 低陷阱密度材料层的主表面平行并与金属氧化物的有源层的主表面接触,以形成与金属氧化物的有源层的低陷阱密度界面。 可以可选地将第二层低陷阱密度材料放置成与金属氧化物的有源层的相对的主表面接触,使得与金属氧化物的活性层的两个表面形成低陷阱密度界面。

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