APODIZATION OF REFRACTIVE INDEX PROFILE IN VOLUME GRATINGS

    公开(公告)号:WO2022081880A1

    公开(公告)日:2022-04-21

    申请号:PCT/US2021/055034

    申请日:2021-10-14

    Abstract: A grating coupler may be fabricated by exposing a photopolymer layer to grating forming light for forming periodic refractive index variations in the photopolymer layer. The photopolymer layer may be exposed to apodization light for reducing an amplitude of the periodic refractive index variations in a spatially-selective manner. The apodization may also be achieved or facilitated by subjecting outer surface(s) of the photopolymer layer to a chemically reactive agent that causes the refractive index contrast to be reduced near the surface(s) of application. The apodized refractive index profile of the gratings facilitates the reduction of optical crosstalk between different gratings of the grating coupler.

    AROMATIC SUBSTITUTED ETHANE-CORE MONOMERS AND POLYMERS THEREOF FOR VOLUME BRAGG GRATINGS

    公开(公告)号:WO2021108204A1

    公开(公告)日:2021-06-03

    申请号:PCT/US2020/061218

    申请日:2020-11-19

    Abstract: The disclosure provides recording materials including aromatic substituted ethane-core derivatized monomers and polymers for use in volume Bragg gratings, including, but not limited to, volume Bragg gratings for holography applications. Several structures are disclosed for monomers and polymers for use in Bragg gratings applications, leading to materials with higher refractive index, low birefringence, and high transparency. The disclosed derivatized monomers and polymers thereof can be used in any volume Bragg gratings materials, including two-stage polymer materials where a matrix is cured in a first step, and then the volume Bragg grating is written by way of a second curing step of a monomer.

    VARIABLE-ETCH-DEPTH GRATINGS
    17.
    发明申请

    公开(公告)号:WO2020176528A1

    公开(公告)日:2020-09-03

    申请号:PCT/US2020/019727

    申请日:2020-02-25

    Abstract: Disclosed herein are techniques for fabricating straight or slanted variable-etch-depth gratings. A photoresist material for fabricating a variable-etch-depth grating in a substrate is sensitive to light with a wavelength shorter than 300 nm and has an etch rate comparable to the etch rate of the substrate. A depth of an exposed portion of a photoresist material layer including the photoresist material correlates with the exposure dose. After exposure using a gray-scale mask and development, the photoresist material layer has a non-uniform thickness. The photoresist material layer with the non-uniform thickness and the underlying substrate are etched using a straight etching or slanted etching process to form the straight or slanted variable-etch-depth grating in the substrate. The variable-etch-depth grating is characterized by a non-uniform depth profile corresponding to the non-uniform thickness of the photoresist material layer before etching.

    SYSTEM FOR MONITORING GRATING FORMATION
    19.
    发明申请

    公开(公告)号:WO2020028894A1

    公开(公告)日:2020-02-06

    申请号:PCT/US2019/045078

    申请日:2019-08-05

    Abstract: A monitoring system monitors changes in an index of refraction of the grating over a time interval that includes the period of time. The monitoring system includes a light source assembly, a probing assembly, a power meter (e.g., a diffraction and/or a transmittance power meter), and a controller. The light source assembly emits a probe beam. The scanning assembly scans the probe beam over an area of the grating. The power meter measures power of a portion of the probe beam that interacts (e.g., is transmitted by or diffracted from) with the area of the grating. The controller determines changes in grating parameters (may be as a function of time) for the grating being formed based in part on measured power readings over the time interval.

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