Abstract:
An imaging sensor of the charge transfer type that limits the transmission of radiation from high intensity light sources. The invention addresses potential saturation levels during exposure or stare time and so saturation is never achieved, this provides for a wider dynamic range.
Abstract:
A photodetector capable of improving dynamic range for input signals is provided. This photodetector includes a photoelectric converting portion, a charge separating portion, a charge accumulating portion, a barrier electrode formed the charge separating portion and the charge accumulating portion, and a barrier-height adjusting portion electrically connected to the barrier electrode. Undesired electric charges such as generated when environment light is incident on the photoelectric converting portion are removed by the charge separating portion. A potential barrier with an appropriate height is formed under the barrier electrode by applying a voltage to the barrier electrode according to an electric charge amount supplied from the charge separating portion to the barrier-height adjusting portion. Electric charges flowing from the charge separating portion into the charge accumulating portion over the potential barrier are provided as an output of the photodetector.
Abstract:
A semiconductor energy sensor having regions for sensing energy and storing/transferring charge having a two-dimensional pixel array on a semiconductor substrate which an energy beam enters, characterized in that each of the regions is provided with transfer electrodes in each pixel and excess charge dumping means provided to one of the transfer electrodes in each pixel.
Abstract:
A solid-state image sensor comprises a plurality of photodetectors (16) in a substrate (12) of a semiconductor material at a major surface (14) of the substrate and arranged in an array of rows and columns. A separate shift register (18), such as a CCD shift register, is in the substrate (12) and extends along each column of the photodetectors (16). Transfer gates (42) are provided to selectively transfer charge carriers from the photodetectors (16) to their adjacent shift register (18). A separate drain region (32) is provided in the substrate (12) at the major surface (14) adjacent each photodetector (16) and between adjacent photodetectors (16) in each column. A virtual barrier region (34) is provided across an edge of each photodetector (16) between the photodetector (16) and its adjacent drain region (32). A gate (24) is provided across the space between adjacent photodetectors (16) in each column for selectively allowing charge carriers in each photodetector (16) to be transferred to the drain (20) of the adjacent photodetector (16) to allow the photodetector (16) to be reset and thereby control the exposure time of the photodetectors (16). The drain region (32) serves as an anti-blooming drain for its adjacent photodetector (16) as well as a drain for resetting the photodetectors (16).
Abstract:
Dispositif de prise de vues à semiconducteurs possédant un élément de prise de vues à semiconducteurs du type à transfert interligne muni d'une unité de photodétection à transfert vertical pourvu d'un photodétecteur (1), d'une porte de lecture (6) et d'une unité de transfert vertical (2), le photodétecteur (1) et l'unité de transfert (2) étant formés sans être couverts par une unité (11) de protection contre la lumière. Un mécanisme obturateur est ouvert lorsque la lumière est reçue par l'élément lorsque la relation Pr
Abstract:
A charge- coupled device (CCD) image sensor (300) includes a layer of a semiconductor material having a first conductivity type. A horizontal CCD channel region (312) of a second conductivity type is disposed in the layer of the semiconductor material. The horizontal CCD channel region includes multiple gates (314, 316, 318, 320) each gate being disposed over a phase, the phases3 being used to shift photo -generated charge through the horizontal CCD channel region. Distinct overflow drain regions (326) are disposed in the layer of semiconducting material, with an overflow drain region electrically connected to only one particular phase of the horizontal CCD channel region.
Abstract:
A lateral overflow drain (610) and a channel stop (608) are fabricated using a double mask process (1300, 1500). Each lateral overflow drain is formed within a respective channel stop. Due to the use of two mask layers, one edge of each lateral overflow drain is aligned with an edge of a respective channel stop.
Abstract:
A lateral overflow drain and a channel stop are fabricated using a double mask process. Each lateral overflow drain is formed within a respective channel stop. Due to the use of two mask layers, one edge of each lateral overflow drain is aligned, or substantially aligned, with an edge of a respective channel stop.