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    METHOD OF PERFORMING LITHOGRAPHY AND LITHOGRAPHY SYSTEM
    22.
    发明申请
    METHOD OF PERFORMING LITHOGRAPHY AND LITHOGRAPHY SYSTEM 审中-公开
    执行算术和图像系统的方法

    公开(公告)号：WO2008016651A3

    公开(公告)日：2008-07-31

    申请号：PCT/US2007017195

    申请日：2007-07-30

    Applicant: HEWLETT PACKARD DEVELOPMENT CO ,  PICCIOTTO CARL ,  GAO JUN ,  WU WEI ,  YU ZHAONING

    Inventor： PICCIOTTO CARL ,  GAO JUN ,  WU WEI ,  YU ZHAONING

    IPC: G03F9/00

    CPC classification number: G03F9/7092 ,  G03F9/7038 ,  G03F9/7042 ,  G03F9/7088

    Abstract: Methods of performing lithography include calculating a displacement vector (74) for a lithography tool (50) using an image (60) of a portion of the lithography tool (50) and a portion of a substrate (10) and an additional image (28) of a portion of an additional lithography tool (30) and a portion of the substrate (10). Methods of aligning objects include positioning a second object (30) proximate a first object (10) and acquiring a first image (38) illustrating a feature (32) on a surface of the second object (30) and a feature (18) on a surface of the first object (10). As additional object (50) is positioned proximate the first object (10), and an additional image (60) is acquired that illustrates a feature (52) on a surface of the additional object (50) and the feature (18) on the surface of the first object (10). The additional image (60) is compared with the first image (38). Imprint molds (30, 50) include at least one non-marking reference feature (32, 52) on animprinting surface of the imprint molds (30, 50).

    Abstract translation: 执行光刻的方法包括使用光刻工具（50）的一部分的图像（60）和基底（10）的一部分和附加图像（28）来计算光刻工具（50）的位移矢量（74） ）附加光刻工具（30）的一部分和基底（10）的一部分。 对准对象的方法包括定位邻近第一物体（10）的第二物体（30）并且获取第二图像（38），该第一图像（38）示出在第二物体（30）的表面上的特征（32） 第一物体（10）的表面。 随着附加物体（50）被定位在第一物体（10）附近，并且获取附加图像（60），其示出了附加物体（50）的表面上的特征（52）和 第一物体（10）的表面。 将附加图像（60）与第一图像（38）进行比较。 压印模具（30,50）包括在压印模具（30,50）的印模表面上的至少一个非标记参考特征（32,52）。

    CONTACT LITHOGRAPHY APPARATUS, SYSTEM AND METHOD
    23.
    发明申请
    CONTACT LITHOGRAPHY APPARATUS, SYSTEM AND METHOD 审中-公开
    接触光刻设备，系统和方法

    公开(公告)号：WO2008048491A3

    公开(公告)日：2008-06-05

    申请号：PCT/US2007021813

    申请日：2007-10-12

    Applicant: HEWLETT PACKARD DEVELOPMENT CO ,  WU WEI ,  WANG SHIH-YUAN ,  LI ZHIYONG ,  WALMSLEY ROBERT

    Inventor： WU WEI ,  WANG SHIH-YUAN ,  LI ZHIYONG ,  WALMSLEY ROBERT

    IPC: G03F7/00 ,  G03F7/20

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/7035

    Abstract: A contact lithography system (100, 200) includes a patterning tool (110, 228a, 510) bearing a pattern (112); a substrate chuck (214) for chucking a substrate (130, 228b) to receive the pattern (112) from the patterning tool (110, 228a, 510); where the system (100, 200) deflects a portion of either the patterning tool (110, 228a, 510) or the substrate (130, 228b) to bring the patterning tool (110, 228a, 510) and a portion of the substrate (130, 228b) into contact; and a stepper (260) for repositioning either or both of the patterning tool (110, 228a, 510) and substrate (130, 228b) to align the pattern (112) with an additional portion of the substrate (130, 228b) to also receive the pattern (112). A method of performing contact lithography comprising: deflecting a portion of either a patterning tool (110, 228a, 510) or a substrate (130, 228b) to bring the patterning tool (110, 228a, 510) and a portion of the substrate (130, 228b) into contact; and repositioning either or both of the patterning tool (110, 228a, 510) and substrate (130, 228b) to align a pattern (112) on the patterning tool (110, 228a, 510) with an additional portion of the substrate (130, 228b) to also receive the pattern (112).

    Abstract translation: 一种接触光刻系统（100,200）包括承载图案（112）的图案化工具（110,228a，510）; 衬底卡盘（214），其用于夹持衬底（130,228b）以从图案化工具（110,228a，510）接收图案（112）; 其中系统（100,200）使图案化工具（110,228a，510）或衬底（130,228b）的一部分偏转以使图案化工具（110,228a，510）和部分衬底 130，228b）接触; 和步进器（260），其用于重新定位图案形成工具（110,228a，510）和衬底（130,228b）中的任一个或两者以使图案（112）与衬底（130,228b）的另外部分对准 接收模式（112）。 一种执行接触光刻的方法，包括：使图案化工具（110,228a，510）或衬底（130,228b）的一部分偏转，以使图案化工具（110,228a，510）和衬底的一部分 130，228b）接触; 以及重新定位图案化工具（110,228a，510）和衬底（130,228b）中的任一者或两者以使图案形成工具（110,228a，510）上的图案（112）与衬底（130,228b）的另外部分 ，228b）也接收图案（112）。

    METHOD OF CONTROLLING NANOWIRE GROWTH AND DEVICE WITH CONTROLLED-GROWTH NANOWIRE
    26.
    发明申请
    METHOD OF CONTROLLING NANOWIRE GROWTH AND DEVICE WITH CONTROLLED-GROWTH NANOWIRE 审中-公开
    控制生长纳米线的纳米线生长和器件的控制方法

    公开(公告)号：WO2007058909A3

    公开(公告)日：2007-07-26

    申请号：PCT/US2006043688

    申请日：2006-11-08

    Applicant: HEWLETT PACKARD DEVELOPMENT CO ,  WU WEI ,  KAMINS THEODORE I ,  SHARMA SHASHANK ,  WILLIAMS R STANLEY

    Inventor： WU WEI ,  KAMINS THEODORE I ,  SHARMA SHASHANK ,  WILLIAMS R STANLEY

    IPC: H01L21/283 ,  H01L21/768 ,  H01L23/52

    CPC classification number: H01L21/76879 ,  H01L21/28525 ,  H01L23/53276 ,  H01L2221/1094 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: Nanowire (260, 360) growth in situ on a planar surface, which is one of a crystalline surface having any crystal orientation, a polycrystalline surface and a non-crystalline surface, is controlled by guiding (160) catalyzed growth from the planar surface in a nano-throughhole (224, 324) of a patterned layer (220, 320) formed on the planar surface, such that the nanowire (260, 360) grows in situ perpendicular to the planar surface. An electronic device (200, 300) includes first and second regions of electronic circuitry (280, 370, 380) vertically spaced by the patterned layer (220, 320). The nano-throughhole (224, 324) of the patterned layer (220, 320) extends perpendicularly between the regions. The first region (324, 376) has the planar surface. The device (200, 300) further includes a nanowire (260, 360) extending perpendicular from a catalyst location on the planar surface of the first region (374, 376) in the nano-throughhole (224, 324). The nanowire (260, 360) forms a component of a nano-scale circuit that connects the regions.

    Abstract translation: 在具有任何晶体取向的晶体表面，多晶表面和非晶体表面之一的平面表面上原位生长的纳米线（260,360）通过引导（160）来自平面表面的催化生长来控制 形成在所述平坦表面上的图案化层（220,320）的纳米通孔（224,324），使得所述纳米线（260,360）垂直于所述平坦表面原位生长。 电子设备（200,300）包括由图案化层（220,320）垂直间隔开的电子电路（280,370,380）的第一和第二区域。 图案化层（220,320）的纳米通孔（224,324）在区域之间垂直延伸。 第一区域（324,376）具有平坦表面。 装置（200,300）还包括从纳米通孔（224,324）中的第一区域（374,376）的平坦表面上的催化剂位置垂直延伸的纳米线（260,360）。 纳米线（260,360）形成连接区域的纳米级电路的组件。

    CROSSBAR-ARRAY DESIGNS AND WIRE ADDRESSING METHODS THAT TOLERATE MISALIGNMENT OF ELECTRICAL COMPONENTS AT WIRE OVERLAP POINTS
    27.
    发明申请
    CROSSBAR-ARRAY DESIGNS AND WIRE ADDRESSING METHODS THAT TOLERATE MISALIGNMENT OF ELECTRICAL COMPONENTS AT WIRE OVERLAP POINTS 审中-公开
    跨导线阵列设计和导线寻址方法，可以阻止电线重叠处电气元件的错位

    公开(公告)号：WO2007053764A2

    公开(公告)日：2007-05-10

    申请号：PCT/US2006042923

    申请日：2006-11-01

    Applicant: HEWLETT PACKARD DEVELOPMENT CO ,  WU WEI ,  KUEKES PHILIP J ,  WILLIAMS R STANLEY

    Inventor： WU WEI ,  KUEKES PHILIP J ,  WILLIAMS R STANLEY

    IPC: G11C8/10

    CPC classification number: G11C13/02 ,  B82Y10/00 ,  G11C8/10 ,  G11C11/54 ,  G11C13/0023 ,  G11C2213/77 ,  G11C2213/81 ,  H01L27/10 ,  H01L27/285 ,  Y10S977/762 ,  Y10S977/932

    Abstract: Various embodiments of the present invention are directed to crossbar array designs that interfaces wires to address wires, despite misalignments between electrical components and wires. In one embodiment, a nanoscale device may be composed of a first layer of two or more wires (1501-1511) and a second layer of two or more address wires (1512-1523) that overlays the first layer. The nanoscale device may also include an intermediate layer (704-804) positioned between the first layer and the second layer. Two or more redundant electrical component patterns (1400) may be fabricated within the intermediate layer so that one or more of the electrical component patterns is aligned with the first and second layers.

    Abstract translation: 尽管电气部件和电线之间未对准，本发明的各种实施例针对交叉开关阵列设计，其将导线连接到地址导线。 在一个实施例中，纳米级器件可以由覆盖第一层的两个或更多个导线（1501-1511）的第一层和两个或更多个地址导线（1512-1523）的第二层组成。 纳米级装置还可以包括位于第一层和第二层之间的中间层（704-804）。 可以在中间层内制造两个或更多冗余电部件图案（1400），使得一个或多个电部件图案与第一和第二层对齐。

    SYSTEM AND METHOD FOR RETRIEVING DIGITAL MULTIMEDIA CONTENT FROM A NETWORK NODE
    28.
    发明申请
    SYSTEM AND METHOD FOR RETRIEVING DIGITAL MULTIMEDIA CONTENT FROM A NETWORK NODE 审中-公开
    从网络节点检索数字多媒体内容的系统和方法

    公开(公告)号：WO2005084381A3

    公开(公告)日：2006-01-05

    申请号：PCT/US2005007145

    申请日：2005-03-03

    Applicant: PACKETVIDEO NETWORK SOLUTIONS ,  ZENG THOMAS ,  FOSTER MICHAEL ,  SEVERA MICHAEL ,  CHAN CHEUK ,  SHERWOOD GREG P ,  WU WEI ,  KOSIBA DAVID

    Inventor： ZENG THOMAS ,  FOSTER MICHAEL ,  SEVERA MICHAEL ,  CHAN CHEUK ,  SHERWOOD GREG P ,  WU WEI ,  KOSIBA DAVID

    IPC: G06F15/16 ,  H04N7/10 ,  H04N7/025

    CPC classification number: H04L65/4092 ,  H04L29/06027 ,  H04L65/4084 ,  H04L65/608 ,  H04L67/325 ,  H04N21/26258 ,  H04N21/4667 ,  H04N21/4825 ,  H04N21/84

    Abstract: A scheme for retrieving digital multimedia content from a network node. A message is provided to the network node by a client application executing on a digital multimedia device, wherein the message includes a multidimensional pointer to a depository of digital multimedia content associated with the network node as well as a timing parameter operable to indicate when the message is to take effect. The multidimensional pointer contains a relative time offset variable as well as a plurality of media identifier dimensions corresponding to a plurality of nested hierarchical levels into which the digital multimedia content is organized. Responsive to the message, content from a particular content source identified by the multidimensional pointer is streamed to the digital multimedia device at a time indicated responsive to the timing parameter.

    Abstract translation: 一种用于从网络节点检索数字多媒体内容的方案。 通过在数字多媒体设备上执行的客户端应用向网络节点提供消息，其中该消息包括到与该网络节点相关联的数字多媒体内容的存储器的多维指针以及可用于指示消息的时间的定时参数 要生效了 多维指针包含相对时间偏移变量以及与组织数字多媒体内容的多个嵌套分层级对应的多个媒体标识符维度。 响应于该消息，来自由多维指针识别的特定内容源的内容在响应于定时参数指示的时间流传输到数字多媒体设备。

    SYSTEM AND METHOD FOR COORDINATING HALF-DUPLEX COMMUNICATIONS PROTOCOLS
    29.
    发明申请
    SYSTEM AND METHOD FOR COORDINATING HALF-DUPLEX COMMUNICATIONS PROTOCOLS 审中-公开
    用于协调双工通信协议的系统和方法

    公开(公告)号：WO2010037013A3

    公开(公告)日：2010-06-03

    申请号：PCT/US2009058583

    申请日：2009-09-28

    Applicant: RESEARCH IN MOTION LTD ,  WOMACK JAMES ,  CAI ZHIJUN ,  WU WEI ,  YU YI

    Inventor： WOMACK JAMES ,  CAI ZHIJUN ,  WU WEI ,  YU YI

    IPC: H04B7/26 ,  H04L5/14

    CPC classification number: H04B7/2656

    Abstract: The present disclosure is directed to a system and method for operating a user agent (UA) and access device located within a communications cell according to a half-duplex (HD), frequency-division duplexing (FDD) protocol. The system and method are designed to accommodate a guard period (GP) between downlink (DL) and uplink (UL) communications from the UA, while addressing the loss of at least part of the DL communication before a subsequent UL subframe to accommodate the GP.

    Abstract translation: 本公开涉及一种用于根据半双工（HD），频分双工（FDD）协议来操作位于通信小区内的用户代理（UA）和接入设备的系统和方法。 该系统和方法被设计为适应来自UA的下行链路（DL）和上行链路（UL）通信之间的保护时段（GP），同时在随后的UL子帧之前解决至少部分DL通信的丢失以适应GP 。

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