Abstract:
The invention provides a class of wedge-type block copolymers having a plurality of chemically different blocks, at least a portion of which incorporates a wedge group-containing block providing useful properties. For example, use of one or more wedge group-containing blocks in some block copolymers of the invention significantly inhibits chain entanglement and, thus, the present block copolymers materials provide a class of polymer materials capable of efficient molecular self-assembly to generate a range of structures, such as periodic nanostructures and microstructures. Materials of the present invention include copolymers having one or more wedge group-containing blocks, and optionally for some applications copolymers also incorporating one or more polymer side group-containing blocks. The present invention also provides useful methods of making and using wedge-type block copolymers.
Abstract:
The present invention relates to a diblock copolymer that may facilitate formation of a finer nano pattern, and be used for manufacture of an electronic device including a nano pattern or a bio sensor, and the like, a method for preparing the same, and a method for forming a nano pattern using the same, The diblock copolymer comprises a hard segment including at least one specific acrylamide-based repeat unit, and a soft segment including at least one (meth)acrylate-based repeat unit.
Abstract:
Provided herein are micelles comprising a plurality of copolymers. In certain instances, micelles provided herein are pH sensitive particles.
Abstract:
An ion gel including an ionic liquid and a block copolymer. The block copolymer includes at least three blocks, and the block copolymer forms a self-assembled ion gel in the ionic liquid. Also, thin film transistors including an ion gel insulator layer, capacitors including an ion gel insulator layer, integrated circuits including transistors including an ion gel insulator layer, and methods for forming each of these devices are described.
Abstract:
Novel methods for forming copolymers, including block copolymers, which comprise one or more olefin units and one or more protected or unprotected hydroxystyrene units are provided.
Abstract:
A polymeric dispersant having a block copolymer structure or a segmented oligomer structure wherein the block copolymer structure or segmented oligomer structure comprises a segment polymerized by monomers according to Formula (I): wherein, R1 represents hydrogen or methyl; Y represents O, S or NH; Aryl represents an aromatic group or a heteroaromatic group; and X represents hydrogen, an alkyl group or a cation. A process for manufacturing the polymeric dispersant and the application of the polymeric dispersant in pigment dispersions, inkjet inks and coloured layers.