公开(公告)号：WO2006125617A2

公开(公告)日：2006-11-30

申请号：PCT/EP2006/004929

申请日：2006-05-24

Applicant: CARL ZEISS SMT AG ,  CONRADI, Olaf ,  FELDMANN, Heiko ,  RICHTER, Gerald ,  BLEIDISTEL, Sascha ,  FROMMEYER, Andreas ,  GRUNER, Toralf ,  HUMMEL, Wolfgang

Inventor： CONRADI, Olaf ,  FELDMANN, Heiko ,  RICHTER, Gerald ,  BLEIDISTEL, Sascha ,  FROMMEYER, Andreas ,  GRUNER, Toralf ,  HUMMEL, Wolfgang

IPC: G03F7/20

CPC classification number: G02B27/0068 ,  G02B3/0081 ,  G02B26/0825 ,  G03F7/7015 ,  G03F7/70266 ,  G03F7/70558 ,  Y10S359/90

Abstract: The invention relates to a method for improving the imaging properties of a microlithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

Abstract translation: 本发明涉及一种用于改善微光刻投影物镜的成像特性的方法，其中所述投影物镜在物平面和像平面之间具有多个透镜，所述多个透镜的第一透镜被分配用于主动的第一操纵器 使透镜变形，第一透镜被变形以至少部分地校正像差，多个透镜中的至少一个第二透镜进一步被分配至少一个第二操纵器，并且第二透镜除了第一透镜之外也变形。 此外，描述了一种用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

公开(公告)号：WO2006114294A3

公开(公告)日：2006-11-02

申请号：PCT/EP2006/003864

申请日：2006-04-26

Applicant: CARL ZEISS SMT AG ,  SOHMER, Alexander ,  DODOC, Aurelian ,  FELDMANN, Heiko ,  ULRICH, Wilhelm ,  FÜRTER, Gerhard ,  EGGER, Rafael ,  MÖGELE, Artur ,  RAUM, Michael

Inventor： SOHMER, Alexander ,  DODOC, Aurelian ,  FELDMANN, Heiko ,  ULRICH, Wilhelm ,  FÜRTER, Gerhard ,  EGGER, Rafael ,  MÖGELE, Artur ,  RAUM, Michael

IPC: G02B19/00 ,  G02B13/14 ,  G03F7/20

Abstract: An illumination system (12) of a microlithographic exposure apparatus (10) comprises a condenser (601; 602; 603; 604; 605; 606) for transforming a pupil plane (54) into a field plane (62) . The condenser has a lens group (L14, L15, L16, L17; L24, L25, L26, L27, L28; L34, L35, L36, L37; L44, L45, L46; L53, L54, L55) that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle (70) focused by the condenser (601; 602; 603; 604; 605) on an on-axis field point (72) converges within each lens of the lens group. At least one lens (L15, L16, L17; L25, L26; L34, L44, L45; L54) of the lens group has a concave surface. The illumination system may further comprise a field stop objective (66; 666, 666') that at least partly corrects a residual pupil aberration of the condenser (601; 602; 603; 604; 605; 606).

公开(公告)号：WO2006077145A3

公开(公告)日：2006-09-21

申请号：PCT/EP2006000518

申请日：2006-01-20

Applicant: ZEISS CARL SMT AG ,  HETZLER JOCHEN ,  BEDER SUSANNE ,  FELDMANN HEIKO

Inventor： HETZLER JOCHEN ,  BEDER SUSANNE ,  FELDMANN HEIKO

IPC: G01B9/021 ,  G01B11/24

CPC classification number: G01B9/021 ,  G01B9/02039 ,  G01B11/2441

Abstract: A method of manufacturing an optical element (5) comprises testing an optical surface (3) of the optical element, using an interferometer Ia directing measuring light (23a) onto the optical surface wherein the measuring light traverses two successive holograms (44, 48) disposed in the beam path of the measuring light upstream of the optical surface.

Abstract translation: 一种制造光学元件（5）的方法包括使用干涉仪1a测试光学元件的光学表面（3），干涉仪1a将测量光（23a）引导到光学表面上，其中测量光穿过两个连续的全息图（44,48） 设置在光学表面上游的测量光束的光路中。

公开(公告)号：WO2006037444A3

公开(公告)日：2006-08-10

申请号：PCT/EP2005009966

申请日：2005-09-16

Applicant: ZEISS CARL SMT AG ,  FELDMANN HEIKO ,  EPPLE ALEXANDER ,  BLAHNIK VLADAN

Inventor： FELDMANN HEIKO ,  EPPLE ALEXANDER ,  BLAHNIK VLADAN

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70341

Abstract: A microlithographic projection exposure apparatus contains a projection objective, whose last optical element on the image side is a dry terminating element (TE; TE2; TE3) that has no refractive power and is designed for dry operation of the projection objective (20; 220; 320). According to the invention, the projection exposure apparatus furthermore contains an immersion terminating element (TE'; TE2'; TE3') that has no refractive power and is designed for immersed operation of the projection objective. The immersion terminating element (TE'; TE2'; TE3') is replaceable with the dry terminating element (TE; TE2; TE3). Preferably, the dry terminating element (TE; TE2; TE3) and/or the immersion terminating element (TE'; TE2'; TE3') is composed of a plurality of plates (TP1, TP2; TP31', TP32'), which are made of materials having different refractive indices.

Abstract translation: 微光刻投影曝光装置包括投影物镜，其投影物镜的最后一个光学元件是干燥的终端元件（TE; TE2; TE3），其不具有屈光力并被设计用于投影物镜（20; 220; 320）。 根据本发明，投影曝光装置还包含没有屈光力的浸没终端元件（TE'; TE2'; TE3'），并被设计用于投影物镜的浸入操作。 浸没端接元件（TE'; TE2'; TE3'）可以用干端接元件（TE; TE2; TE3）代替。 优选地，干终端元件（TE; TE2; TE3）和/或浸没端接元件（TE'; TE2'; TE3'）由多个板（TP1，TP2; TP31'，TP32'）组成，其中 由具有不同折射率的材料制成。

公开(公告)号：WO2006029796A3

公开(公告)日：2006-08-03

申请号：PCT/EP2005009804

申请日：2005-09-13

Applicant: ZEISS CARL SMT AG ,  BROTSACK MARKUS ,  DEGUENTHER MARKUS ,  ULRICH WILHELM ,  WIETZORREK JOACHIM ,  WANGLER JOHANNES ,  FELDMANN HEIKO ,  ZEILER ANDREAS

Inventor： BROTSACK MARKUS ,  DEGUENTHER MARKUS ,  ULRICH WILHELM ,  WIETZORREK JOACHIM ,  WANGLER JOHANNES ,  FELDMANN HEIKO ,  ZEILER ANDREAS

IPC: G03F7/20

CPC classification number: G03F7/70191

Abstract: An illumination system (12) for a microlithographic pro­jection exposure apparatus (10) comprises a masking de­vice (36) and a masking objective (38; 138; 238) which projects the masking device (36) onto an image plane (18). The illumination system further includes an optical correction element (46; 34'; 146a, 146b; 242; 242a, 242b, 242c) having a surface (48; 44; 44'; 148a, 148b) that is either aspherically shaped or supports diffractive struc­tures that have at least substantially the effect of an aspherical surface. This surface is arranged at least ap­proximately in a field plane (40; 140) which precedes the image plane (18) of the masking objective The aspheri­cally acting surface is designed such that a principal ray distribution generated by the illumination system (12; 112; 212) in the image plane matches a principal ray distribution required by a projection objective (16).

Abstract translation: 用于微光刻投影曝光装置（10）的照明系统（12）包括将掩模装置（36）投影到图像平面（18）上的掩蔽装置（36）和掩蔽物镜（38; 138; 238）。 所述照明系统还包括具有表面（48; 44; 44'; 148a，148b）的光学校正元件（46; 34'; 146a，146b; 242; 242a，242b，242c），所述表面是非球面形或支撑衍射 具有至少基本上非球面表面效果的结构。 该表面至少大致布置在掩模对象的图像平面（18）之前的场平面（40; 140）中。非球面作用表面被设计成使得由照明系统（12; 112; 在图像平面中匹配投影物镜（16）所需的主光线​​分布。

公开(公告)号：WO2006077145A2

公开(公告)日：2006-07-27

申请号：PCT/EP2006/000518

申请日：2006-01-20

Applicant: CARL ZEISS SMT AG ,  HETZLER, Jochen ,  BEDER, Susanne ,  FELDMANN, Heiko

Inventor： HETZLER, Jochen ,  BEDER, Susanne ,  FELDMANN, Heiko

IPC: G01B9/021 ,  G01B11/24

CPC classification number: G01B9/021 ,  G01B9/02039 ,  G01B11/2441

Abstract: A method of manufacturing an optical element (5) comprises testing an optical surface (3) of the optical element, using an interferometer Ia directing measuring light (23a) onto the optical surface wherein the measuring light traverses two successive holograms (44, 48) disposed in the beam path of the measuring light upstream of the optical surface.

Abstract translation: 制造光学元件（5）的方法包括使用将测量光（23a）引导到光学表面上的干涉仪1a来测试光学元件的光学表面（3），其中测量光穿过两个连续的全息图（44,48） 设置在光学表面上游的测量光束的光束路径中。

公开(公告)号：WO2006053751A2

公开(公告)日：2006-05-26

申请号：PCT/EP2005/012327

申请日：2005-11-17

Applicant: CARL ZEISS SMT AG ,  BEIERL, Helmut ,  BLEIDISTEL, Sascha ,  SINGER, Wolfgang ,  GRUNER, Toralf ,  EPPLE, Alexander ,  WABRA, Norbert ,  BEDER, Susanne ,  WEBER, Jochen ,  FELDMANN, Heiko ,  SCHWAER, Bärbel ,  ROGALSKY, Olaf ,  KAZI, Ari

Inventor： BEIERL, Helmut ,  BLEIDISTEL, Sascha ,  SINGER, Wolfgang ,  GRUNER, Toralf ,  EPPLE, Alexander ,  WABRA, Norbert ,  BEDER, Susanne ,  WEBER, Jochen ,  FELDMANN, Heiko ,  SCHWAER, Bärbel ,  ROGALSKY, Olaf ,  KAZI, Ari

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70891

Abstract: Eine mikrolithographische Projektionsbelichtungsanlage weist ein Projektionsobjektiv (20) auf, das ein Objekt (24) auf eine Bildebene (28) abbildet und eine Linse (L3) mit einer gekrümmten Fläche (S) hat. In dem Projektions­objektiv (20) befindet sich ein flüssiges oder festes Me­dium (34), das unmittelbar an die gekrümmte Fläche (S) über einen Bereich hinweg angrenzt, der für die Abbildung des Objekts (24) nutzbar ist. Die Projektionsbelichtungs­anlage weist außerdem einen verstellbaren Manipulator (M) zur Verringerung einer Bildfeldwölbung auf, die durch ei­ne Erwärmung des Mediums (34) während des Projektionsbe­triebs verursacht wird.

Abstract translation:

的微光刻投射曝光设备包括：一个投影透镜（20）到图像平面（28）的图像的对象（24）和具有一个冠导航中使用的透镜（L3）奈德FL＆AUML;枝（S）具有 ， 在投影透镜20中，存在液体或固体介质34，其在与图像相邻的区域上紧邻曲面S 物体（24）的尺寸是可用的。 投影曝光＆害羞;植物具有坳道除了可调节的操纵器（M），以减少一个Bildfeldw＆OUML; lbung，其通过EI＆害羞; NE广告＆AUML;所述介质（34）的变暖W＆AUML; Projektionsbe＆期间害羞;引起驱动。

公开(公告)号：WO2005119369A1

公开(公告)日：2005-12-15

申请号：PCT/EP2005/005979

申请日：2005-06-03

Applicant: CARL ZEISS SMT AG ,  SCHEIBLE, Patrick ,  PAZIDIS, Alexandra ,  GARREIS, Reiner ,  TOTZECK, Michael ,  FELDMANN, Heiko ,  GRÄUPNER, Paul ,  ROSTALSKI, Hans-Jürgen ,  SINGER, Wolfgang

Inventor： SCHEIBLE, Patrick ,  PAZIDIS, Alexandra ,  GARREIS, Reiner ,  TOTZECK, Michael ,  FELDMANN, Heiko ,  GRÄUPNER, Paul ,  ROSTALSKI, Hans-Jürgen ,  SINGER, Wolfgang

IPC: G03F7/20

CPC classification number: G02B13/02 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70308

Abstract: In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.

Abstract translation: 在将投影物镜的物平面中布置的图案成像到投影物镜的像平面中的投影物镜中，提供至少一个光学部件，该光学元件具有基板，其中至少一个基板表面被干涉层覆盖 系统具有在光学部件的可用横截面上的反射率和/或透射率的大的空间调制，该调制适于投影物镜的其余部件的空间传输分布，使得强度分布 与没有干涉层系统的投射物镜相比，在瞳孔表面中测量的辐射具有显着降低的空间调制。