Abstract:
An electronic device includes a silicon substrate (2) having a first side and a second side. A structural layer of gallium nitride (6) is formed over the first side of the silicon substrate and includes an active area of the electronic device. A transition layer (8) is provided between the substrate and the structural layer. The transition layer electrically and/or thermally insulated the substrate and the structural layer from one another. A via hole (20) made of a conductive material extends through the structural layer and the transition layer. The via hole is electrically and/or thermally connected to the active area of the electronic device and to the substrate.