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公开(公告)号：WO0155475A2
公开(公告)日：2001-08-02
申请号：PCT/RU0100027
申请日：2001-01-25
Applicant: V I P VACUUM ION PLASMA TECHNO , DODONOV ALEXANDR IGOREVICH , DIAMANT VALERY , BASHKOV VALERY MIKHAILOVICH
CPC classification number: C23C14/32 , C23C14/022 , H01J37/3178 , H01J37/32412 , H01J37/34 , H01J2237/3142 , H01J2237/32
Abstract: The present invention relates to a system (1) and method for deposition of coatings on a substrate (10). More particularly, the invention concerns a system and method for low-temperature deposition of corrosion-proof, wear-resistant ion-plasma coatings. A system for deposition of an ion plasma coating on a substrate, said system comprising: a housing (2) defining a vacuum chamber and having access means for the introduction and retrieval of a substrate (10) to be coated; a plasma vacuum deposition (PVD) source (8) communicating with the interior of said housing; an electrically conductive support (12) on which said substrate is placed; a gas ion-plasma source (14) cathode assembly communicating with said chamber in spaced-apart relationship to said support; a first power supply (20') electrically connected to said support; a second power supply (20'') electrically connected to said cathode assembly, and a third power supply (20''') of additional discharge electrically connectable to said cathode assembly, wherein said power supplies are operative to effect pulsed discharge on said gas ion-plasma source cathode assembly or pulsed accelerating voltage on said support.
Abstract translation: 本发明涉及一种用于在衬底（10）上沉积涂层的系统（1）和方法。 更具体地说，本发明涉及用于耐腐蚀，耐磨的离子等离子体涂层的低温沉积的系统和方法。 一种用于在衬底上沉积离子等离子体涂层的系统，所述系统包括：限定真空室的壳体（2），并具有用于引入和取出待涂覆的衬底（10）的入口装置; 与所述壳体的内部连通的等离子体真空沉积（PVD）源（8）; 导电支撑件（12），其上放置所述基板; 气体离子源（14）阴极组件，与所述腔室以间隔开的关系与所述支撑件连通; 电连接到所述支撑件的第一电源（20'）; 电连接到所述阴极组件的第二电源（20“）和与所述阴极组件电连接的另外的放电的第三电源（20”），其中所述电源用于在所述气体上实现脉冲放电 离子 - 等离子体源极阴极组件或所述支撑件上的脉冲加速电压。
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