ULTRAVIOLET CURING APPARATUS FOR CONTINUOUS MATERIAL
    1.
    发明申请
    ULTRAVIOLET CURING APPARATUS FOR CONTINUOUS MATERIAL 审中-公开
    用于连续材料的ULTRAVIOLET固化装置

    公开(公告)号:WO2010039945A3

    公开(公告)日:2011-01-13

    申请号:PCT/US2009059212

    申请日:2009-10-01

    Abstract: An ultraviolet radiation curing system (10) is disclosed for treating a substrate (26), such as fiber optic cable or silicone tubing. The system (10) comprises a processing chamber (12) allowing transport of a continuous piece of substrate (26) to be treated. As the substrate (26) moves through the processing chamber (12), ultraviolet radiation from a plasma lamp (34) activated by a microwave generator (36) treats the surface of the substrate (26). The system (10) comprises two elliptical reflectors (42, 46) of different sizes so that larger diameter substrates may be efficiently treated with ultraviolet radiation. The system (10) may also comprise an ultraviolet-transmissive conduit (54) enclosing the substrate (26) and split into a first portion (84) and a second portion (86), where the second portion (86) is movable from the first portion (84) to open the conduit (54) and allow insertion or alignment of the substrate (26) within the conduit (54) and processing chamber (12).

    Abstract translation: 公开了用于处理诸如光纤电缆或硅胶管的基底(26)的紫外线辐射固化系统(10)。 系统(10)包括允许输送待处理的连续的基底片(26)的处理室(12)。 当基板(26)移动通过处理室(12)时,来自由微波发生器(36)激活的等离子体灯(34)的紫外线辐射处理基板(26)的表面。 系统(10)包括两个不同尺寸的椭圆形反射器(42,46),从而可以用紫外线辐射有效地处理较大直径的基板。 系统(10)还可以包括封装基板(26)并分成第一部分(84)和第二部分(86)的紫外线透射导管(54),其中第二部分(86)可从 第一部分(84)以打开导管(54)并允许衬底(26)在导管(54)和处理室(12)内的插入或对准。

    ULTRAVIOLET CURING APPARATUS FOR CONTINUOUS MATERIAL
    2.
    发明申请
    ULTRAVIOLET CURING APPARATUS FOR CONTINUOUS MATERIAL 审中-公开
    用于连续材料的ULTRAVIOLET固化装置

    公开(公告)号:WO2010039945A2

    公开(公告)日:2010-04-08

    申请号:PCT/US2009/059212

    申请日:2009-10-01

    Abstract: An ultraviolet radiation curing system (10) is disclosed for treating a substrate (26), such as fiber optic cable or silicone tubing. The system (10) comprises a processing chamber (12) allowing transport of a continuous piece of substrate (26) to be treated. As the substrate (26) moves through the processing chamber (12), ultraviolet radiation from a plasma lamp (34) activated by a microwave generator (36) treats the surface of the substrate (26). The system (10) comprises two elliptical reflectors (42, 46) of different sizes so that larger diameter substrates may be efficiently treated with ultraviolet radiation. The system (10) may also comprise an ultraviolet-transmissive conduit (54) enclosing the substrate (26) and split into a first portion (84) and a second portion (86), where the second portion (86) is movable from the first portion (84) to open the conduit (54) and allow insertion or alignment of the substrate (26) within the conduit (54) and processing chamber (12).

    Abstract translation: 公开了用于处理诸如光纤电缆或硅胶管的基底(26)的紫外线辐射固化系统(10)。 系统(10)包括允许输送待处理的连续的基底片(26)的处理室(12)。 当基板(26)移动通过处理室(12)时,来自由微波发生器(36)激活的等离子体灯(34)的紫外线辐射处理基板(26)的表面。 系统(10)包括两个不同尺寸的椭圆形反射器(42,46),从而可以用紫外线辐射有效地处理较大直径的基板。 系统(10)还可以包括封装基板(26)并分成第一部分(84)和第二部分(86)的紫外线透射导管(54),其中第二部分(86)可从 第一部分(84)以打开导管(54)并允许衬底(26)在导管(54)和处理室(12)内的插入或对准。

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