Abstract:
An apparatus (10) for generating ultraviolet radiation includes a pair of magnetrons (12) coupled to a longitudinally extending microwave chamber (14) for generating standing microwave energy waves within the chamber (14). Microwave energy from the magnetrons (12) is directly coupled to the microwave chamber (14) without the use of coupling slots, antennas or other coupling structures. A longitudinally extending electrodeless plasma bulb (20) is mounted within the microwave chamber (14) and is operable to emit ultraviolet radiation (24) in response to excitation by the microwave energy generated by the pair of magnetrons (12). The microwave chamber (14) includes a pair of longitudinally extending tuning walls (42) positioned on opposite sides of the plasma lamp bulb (20) and capable of overlapping the standing microwave energy waves generally along the longitudinal length of the plasma bulb (20).
Abstract:
A reflector (42) for use in a microwave excited ultraviolet lamp system (10) having a plasma lamp bulb (20). The reflector (42) includes a pair of longitudinally extending reflector panels (46) that are mounted in opposing, i.e., mirror facing relationship, and in space relationship to the plasma lamp bulb (20). A longitudinally extending intermediate member (52) is mounted in spaced relationship to the pair of reflector panels (46) and to the plasma lamp bulb (20). The reflector panels (46) and the intermediate member (52) form a pair of longitudinally extending slots (64) that are operable to pass air toward the plasma lamp bulb (20) to envelop the bulb (20) effectively entirely about its outer surface. Alternatively, the pair of reflector panels (46e) are connected to longitudinally extending edges (58e) of the intermediate member (52e). The intermediate member (52e) includes multiple apertures (78) formed therethrough that are operable to pass air toward the bulb (20) to envelope the bulb (20) effectively entirely about its outer surface. A method of cooling a plasma lamp bulb (20) in a microwave excited ultravoilet lamp system (10) is also disclosed.
Abstract:
Methods and apparatus for producing high quality closed cell foams for use in applications such as coatings, sealant beads, seam filling and gaskets. In a first embodiment an in-line single pass static mixing device (10) containing a very large number of individual mixing elements (12) is used to homogeneously disperse a gas throughout a highly viscous liquid polymeric material such as a plastisol, silicone, butyl or urethane based material. In a second embodiment both a dynamic mixer (3a) and a single pass static mixer (3b) are used in series to form the closed cell foam.
Abstract:
An ultraviolet radiation curing system (10) is disclosed for treating a substrate (26), such as fiber optic cable or silicone tubing. The system (10) comprises a processing chamber (12) allowing transport of a continuous piece of substrate (26) to be treated. As the substrate (26) moves through the processing chamber (12), ultraviolet radiation from a plasma lamp (34) activated by a microwave generator (36) treats the surface of the substrate (26). The system (10) comprises two elliptical reflectors (42, 46) of different sizes so that larger diameter substrates may be efficiently treated with ultraviolet radiation. The system (10) may also comprise an ultraviolet-transmissive conduit (54) enclosing the substrate (26) and split into a first portion (84) and a second portion (86), where the second portion (86) is movable from the first portion (84) to open the conduit (54) and allow insertion or alignment of the substrate (26) within the conduit (54) and processing chamber (12).
Abstract:
An ultraviolet radiation curing system (10) is disclosed for treating a substrate (26), such as fiber optic cable or silicone tubing. The system (10) comprises a processing chamber (12) allowing transport of a continuous piece of substrate (26) to be treated. As the substrate (26) moves through the processing chamber (12), ultraviolet radiation from a plasma lamp (34) activated by a microwave generator (36) treats the surface of the substrate (26). The system (10) comprises two elliptical reflectors (42, 46) of different sizes so that larger diameter substrates may be efficiently treated with ultraviolet radiation. The system (10) may also comprise an ultraviolet-transmissive conduit (54) enclosing the substrate (26) and split into a first portion (84) and a second portion (86), where the second portion (86) is movable from the first portion (84) to open the conduit (54) and allow insertion or alignment of the substrate (26) within the conduit (54) and processing chamber (12).