LIFT PIN, AND WAFER-PROCESSING APPARATUS COMPRISING SAME
    1.
    发明申请
    LIFT PIN, AND WAFER-PROCESSING APPARATUS COMPRISING SAME 审中-公开
    提升针和包含相同的加工装置

    公开(公告)号:WO2010101423A3

    公开(公告)日:2010-11-25

    申请号:PCT/KR2010001349

    申请日:2010-03-04

    CPC classification number: H01L21/68742

    Abstract: A lift pin comprises a main body and a support unit, wherein said main body is inserted into a through-hole of a susceptor on which a wafer is disposed, such that the main body is vertically movable, and wherein said support unit is coupled to the upper surface of the main body to support the wafer, and made of a material having a hardness lower than that of the wafer to protect the surface of the wafer from scratches.

    Abstract translation: 提升销包括主体和支撑单元,其中所述主体插入到其上设置有晶片的基座的通孔中,使得主体可垂直移动,并且其中所述支撑单元联接到 主体的上表面以支撑晶片,并且由具有低于晶片硬度的材料制成,以保护晶片的表面免受划伤。

    ELECTROSTATIC CHUCK AND A SUBSTRATE-PROCESSING DEVICE COMPRISING THE SAME
    2.
    发明申请
    ELECTROSTATIC CHUCK AND A SUBSTRATE-PROCESSING DEVICE COMPRISING THE SAME 审中-公开
    静电切割机和包括其的基板加工装置

    公开(公告)号:WO2011152620A3

    公开(公告)日:2012-04-19

    申请号:PCT/KR2011003625

    申请日:2011-05-17

    CPC classification number: H01L21/6833

    Abstract: An electrostatic chuck comprises an electrostatic layer and a heat-emitting layer. The electrostatic layer has disposed therein an electrostatic electrode which generates an electrostatic force for securing a substrate placed thereon, while also having a first heat transfer coefficient. The heat-emitting layer is disposed underneath the electrostatic layer and has disposed therein a heat-emitting electrode for heating the substrate, while also having a second heat transfer coefficient higher than the first heat transfer coefficient.

    Abstract translation: 静电卡盘包括静电层和发热层。 静电层在其中设置有静电电极,其产生用于固定其上放置的基板的静电力,同时还具有第一传热系数。 发热层设置在静电层下方,并且在其中设置有用于加热基板的发热电极,同时还具有高于第一传热系数的第二传热系数。

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