公开(公告)号：WO2005111796A2

公开(公告)日：2005-11-24

申请号：PCT/US2005/016054

申请日：2005-05-09

申请人： MENTOR GRAPHICS CORPORATION ,  SAWICKI, Joseph, D. ,  FERGUSON, John, G. ,  DHAR, Sanjay ,  ROBLES, Juan, Andres, Torres ,  RAJSKI, Janusz, E.

发明人： SAWICKI, Joseph, D. ,  FERGUSON, John, G. ,  DHAR, Sanjay ,  ROBLES, Juan, Andres, Torres ,  RAJSKI, Janusz, E.

IPC分类号： G06F9/455

CPC分类号： G06F17/50 ,  G01R31/318357 ,  G06F11/263 ,  G06F2217/14 ,  G06F2217/74

摘要： A defect identification tool is disclosed that predicts locations at which defects in a microdevice are most likely to occur. The tool may identify both a type of defect and the particular netlists in which that defect is likely to occur. A test circuit generation tool can then subsequently use this defect information to generate a test circuit that tests for the defect in the identified portions of the microcircuit. Similarly, an automatic test pattern generation tool may use the defect location information to generate test data custom-tailored to check for faults corresponding to the identified defect in the specified portions of the microcircuit. Various implementations of the tool may be used both to identify the locations at which defects caused by systematic errors, such as manufacturing process deficiencies or flaws, are most likely to occur and the locations at which randomly-created defects are most likely to occur.

摘要翻译： 公开了一种缺陷识别工具，其预测微型设备中最有可能发生缺陷的位置。 该工具可以识别缺陷的类型和可能发生缺陷的特定网表。 然后，测试电路生成工具随后可以使用该缺陷信息来生成测试电路，该测试电路测试微电路的识别部分中的缺陷。 类似地，自动测试图形生成工具可以使用缺陷位置信息来生成定制的测试数据，以检查与微电路的指定部分中的所识别的缺陷相对应的故障。 工具的各种实现可以用于识别由系统错误（诸如制造过程缺陷或缺陷）最可能发生的缺陷以及随机创建的缺陷最可能发生的位置的位置。

公开(公告)号：WO2015163838A1

公开(公告)日：2015-10-29

申请号：PCT/US2014/034738

申请日：2014-04-21

申请人： DHAR, Sanjay ,  KHARAZMI, Mohammad, Ali ,  ZEKAVATI, Shahorkh

发明人： DHAR, Sanjay ,  KHARAZMI, Mohammad, Ali ,  ZEKAVATI, Shahorkh

IPC分类号： A61K35/00 ,  A61K35/12 ,  C12N5/0775

CPC分类号： A61K8/981 ,  A61K8/922 ,  A61K35/12 ,  A61K35/28 ,  A61K2800/80 ,  A61K2800/86 ,  A61Q5/008 ,  A61Q5/02 ,  A61Q5/12 ,  A61Q7/00 ,  A61Q19/00 ,  A61Q19/002 ,  A61Q19/02 ,  A61Q19/08 ,  A61Q19/10

摘要： Dermal treatment compositions include medium recovered from an adipose-derived stem cell culture where the medium is collected under defined conditions. The medium includes growth factors and other materials that, when transported to living portions of the skin, improve the condition of damaged or aged skin. The compositions include combinations of transport ingredients in controlled proportions for effective topical application.

摘要翻译： 真皮处理组合物包括从在规定条件下收集培养基的脂肪来源的干细胞培养物回收的培养基。 介质包括生长因子和其他材料，当被运送到皮肤的生活部分时，改善受损或老化的皮肤的状况。 所述组合物包括用于有效局部施用的受控比例的运输成分的组合。

公开(公告)号：WO2005010690A2

公开(公告)日：2005-02-03

申请号：PCT/US2004022831

申请日：2004-07-16

申请人： MENTOR GRAPHICS CORP ,  SAWICKI JOSEPH D ,  GRODD LAURENCE W ,  FERGUSON JOHN G ,  DHAR SANJAY

发明人： SAWICKI JOSEPH D ,  GRODD LAURENCE W ,  FERGUSON JOHN G ,  DHAR SANJAY

IPC分类号： G06F20060101 ,  G06F9/455 ,  G06F15/00 ,  G06F17/50 ,  G06F

CPC分类号： G06F17/50 ,  G05B2219/35028 ,  G05B2219/45028 ,  G06F2217/12 ,  Y02P90/265

摘要： Techniques are disclosed for modifying an existing microdevice design to improve its manufacturability. With these techniques, a designer receives manufacturing criteria associated with data in a design. The associated design data then is identified and provided to the microdevice designer, who may choose to modify the design based upon the manufacturing criteria. In this manner, the designer can directly incorporate manufacturing criteria from the foundry in the original design of the microdevice.

摘要翻译： 公开了用于修改现有微型设计设计以提高其可制造性的技术。 利用这些技术，设计者接收与设计中的数据相关的制造标准。 然后，相关联的设计数据被识别并提供给微设计者，他们可以基于制造标准选择修改设计。 以这种方式，设计人员可以直接在微型设备的原始设计中纳入铸造厂的制造标准。

公开(公告)号：WO2005010690A3

公开(公告)日：2005-02-03

申请号：PCT/US2004/022831

申请日：2004-07-16

申请人： MENTOR GRAPHICS CORPORATION ,  SAWICKI, Joseph, D. ,  GRODD, Laurence, W. ,  FERGUSON, John, G. ,  DHAR, Sanjay

发明人： SAWICKI, Joseph, D. ,  GRODD, Laurence, W. ,  FERGUSON, John, G. ,  DHAR, Sanjay

IPC分类号： G06F15/00

摘要： Techniques are disclosed for modifying an existing micro-device design to improve its manufacturability. With these techniques, a designer receives manufacturing criteria associated with data in a design (Figure 4). The associated design data then is identified and provided to the micro-device designer, who may choose to modify the design based upon the manufacturing criteria (Figure 5A). In this manner, the designer can directly incorporate manufacturing criteria from the foundry in the original design of the micro-device (Figure 5B).

公开(公告)号：WO2005111796A3

公开(公告)日：2007-04-12

申请号：PCT/US2005016054

申请日：2005-05-09

申请人： MENTOR GRAPHICS CORP ,  SAWICKI JOSEPH D ,  FERGUSON JOHN G ,  DHAR SANJAY ,  ROBLES JUAN ANDRES TORRES ,  RAJSKI JANUSZ E

发明人： SAWICKI JOSEPH D ,  FERGUSON JOHN G ,  DHAR SANJAY ,  ROBLES JUAN ANDRES TORRES ,  RAJSKI JANUSZ E

IPC分类号： G06F17/50 ,  G01R31/3183 ,  G06F9/455

CPC分类号： G06F17/50 ,  G01R31/318357 ,  G06F11/263 ,  G06F2217/14 ,  G06F2217/74

摘要： A defect identification tool is disclosed that predicts locations at which defects in a microdevice are most likely to occur (Fig. 6, #601). The tool may identify both a type of defect and the particular netlists in which that defect is likely to occur (Fig. 6, #603). A test circuit generation tool can then subsequently use this defect information to generate a test circuit that tests for the defect in the identified portions of the microcircuit (Fig. 6, #619). Similarly, an automatic test pattern generation tool may use the defect location information to generate test data custom-tailored to check for faults corresponding to the identified defect in the specified portions of the microcircuit. Various implementations of the tool may be used both to identify the locations at which defects caused by systematic errors, such as manufacturing process deficiencies or flaws, are most likely to occur and the locations at which randomly-created defects are most likely to occur.

摘要翻译： 公开了一种缺陷识别工具，其预测微型设备中最有可能发生缺陷的位置（图6，＃601）。 该工具可以识别缺陷的类型和可能发生缺陷的特定网表（图6，＃603）。 然后，测试电路生成工具可以随后使用该缺陷信息来生成测试电路，以测试微电路的识别部分中的缺陷（图6，＃619）。 类似地，自动测试图形生成工具可以使用缺陷位置信息来生成定制的测试数据，以检查与微电路的指定部分中的所识别的缺陷相对应的故障。 工具的各种实现可以用于识别由系统错误（诸如制造过程缺陷或缺陷）最可能发生的缺陷以及随机创建的缺陷最可能发生的位置的位置。