公开(公告)号：WO2017217882A1

公开(公告)日：2017-12-21

申请号：PCT/RU2016/000360

申请日：2016-06-14

申请人： EUV LABS, LTD. ,  ISTEQ, B.V.

发明人： ANTSIFEROV, Pavel Stanislavovich ,  VINOKHODOV, Aleksandr Yurievich ,  IVANOV, Vladimir Vitalievich ,  KOSHELEV, Konstantin Nikolaevich ,  KRYVOKORYTOV, Mikhail Sergeyevich ,  KRIVTSUN, Vladimir Mikhailovich ,  LASH, Aleksandr Andreevich ,  MEDVEDEV, Vyacheslav Valerievich ,  SIDELNIKOV, Yury Viktorovich ,  YAKUSHEV, Oleg Feliksovich ,  GLUSHKOV, Denis ,  ELLWI, Samir ,  SEROGLAZOV, Pavel

IPC分类号： H01S3/091 ,  H05H1/00

CPC分类号： H05G2/008 ,  G21K1/10 ,  H01S3/0007 ,  H05G2/005

摘要： The invention provides a method and apparatus for a commercially viable EUV light source for EUV metrology and actinic inspection of EUV lithography masks. The invention is carried out using a laser target in the form of a continuous jet of liquid Lithium, circulated in a closed loop system by means of a high temperature pump. The collector mirror is placed outside the vacuum chamber in an environment filled with an inert gas and EUV output to a collector mirror is provided through the spectral purity filter, configured as an EUV exit window for the vacuum chamber. In the vacuum chamber, the input window for the laser beam is coated with a screening optical element. Evaporative cleaning of the EUV spectral purity filter and the screening optical element is provided. The protective shield with a temperature higher than 180 °C may be adjusted around the target jet.

摘要翻译： 本发明提供了用于商业上可行的EUV光源的方法和设备，用于EUV光刻掩模的EUV测量和光化检测。 本发明使用液态锂连续射流形式的激光靶，借助于高温泵在闭环系统中循环。 将收集器反射镜放置在真空室外部的充满惰性气体的环境中，并且通过光谱纯度滤光片提供EUV输出至收集镜，该光谱纯度滤光片被配置为用于真空室的EUV出射窗。 在真空室中，用于激光束的输入窗口涂覆有屏蔽光学元件。 提供EUV光谱纯度滤光片和筛选光学元件的蒸发清洁。 温度高于180℃的保护罩可以在目标射流周围进行调整。