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    ELECTRONIC DEVICE INCLUDING A PYRIMIDINE COMPOUND
    1.
    发明申请
    ELECTRONIC DEVICE INCLUDING A PYRIMIDINE COMPOUND 审中-公开
    包含吡啶化合物的电子器件

    公开(公告)号：WO2012088192A1

    公开(公告)日：2012-06-28

    申请号：PCT/US2011/066313

    申请日：2011-12-20

    Applicant: E. I. DU PONT DE NEMOURS AND COMPANY ,  FENNIMORE, Adam ,  HOWARD, Michael, Henry, Jr.

    Inventor： FENNIMORE, Adam ,  HOWARD, Michael, Henry, Jr.

    IPC: C07D239/26 ,  C07D401/10 ,  C07D401/14

    CPC classification number: H01L51/0067 ,  C07D239/26 ,  C07D401/10 ,  C07D401/14 ,  C09K11/06

    Abstract: There is provided a compound having Formula I or Formula II In Formula I: R 1 -R 4 are the same or different and are H, D, alkyl, silyl, alkoxy, cyano or aryl. At least two of R 1 -R 4 are aryl groups and at least one aryl group includes an N,O,S-heterocycle. When two of R 1 -R 4 include N-carbazolyl groups, two of R 1 -R 4 are not aryl; In Formula II: Q is a single bond or a hydrocarbon aryl; and R 5 and R 6 are the same or different at each occurrence and are H, D, alkyl, silyl, alkoxy, cyano or aryl. At least one of R 5 and at least one of R 6 are an aryl group. At least one aryl group includes an N,O,S-heterocycle.

    Abstract translation: 提供具有式I或式II的化合物在式I中：R 1 -R 4相同或不同，为H，D，烷基，甲硅烷基，烷氧基，氰基或芳基。 R 1 -R 4中的至少两个为芳基，至少一个芳基包括N，O，S-杂环。 当R 1 -R 4中的两个包括N-咔唑基时，R 1 -R 4中的两个不是芳基; 在式II中：Q是单键或烃芳基; R 5和R 6在每次出现时相同或不同，为H，D，烷基，甲硅烷基，烷氧基，氰基或芳基。 R5中的至少一个和R6中的至少一个是芳基。 至少一个芳基包括N，O，S-杂环。

    PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME
    2.
    发明申请
    PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME 审中-公开
    用于制造包含层的工艺和材料及其制品

    公开(公告)号：WO2012087977A1

    公开(公告)日：2012-06-28

    申请号：PCT/US2011/065929

    申请日：2011-12-19

    Applicant: E. I. DU PONT DE NEMOURS AND COMPANY ,  RADU, Nora, Sabina ,  FENNIMORE, Adam

    Inventor： RADU, Nora, Sabina ,  FENNIMORE, Adam

    IPC: H01L51/00 ,  H01L51/56

    CPC classification number: H01L51/0004 ,  H01L51/0003 ,  H01L51/0007 ,  H01L51/0018 ,  H01L51/0035 ,  H01L51/0059 ,  H01L51/5048 ,  H01L51/56

    Abstract: There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer. The priming material has Formula (I). In Formula (I): Ar 1 through Ar 4 are the same or different and are aryl groups; L is a spiro group, an adamantyl group, bicyclic cyclohexyl, deuterated analogs thereof, or substituted derivatives thereof; R1 is^he same or different at each occurrence and is D, F, alkyl, aryl, alkoxyl, silyl, or a crosslinkable group, where adjacent R 1 groups can be joined together to form an aromatic ring; R 2 is the same or different at each occurrence and is H, D, or halogen; a is the same or different at each occurrence and is an integer from 0-4; and n is an integer greater than 0.

    Abstract translation: 提供了一种用于在第一层上形成包含的第二层的方法，包括以下步骤：形成具有第一表面能的第一层; 用起动材料处理第一层以形成起动层; 以辐射模式曝光引发层，导致曝光区域和未曝光区域; 开发底漆层以有效地从未曝光区域去除底漆层，从而产生具有起泡层图案的第一层，其中底漆层的图案具有高于第一表面能的第二表面能; 以及通过在第一层上的起动层的图案上的液体沉积形成第二层。 起动材料具有式（I）。 在式（I）中：Ar 1至Ar 4相同或不同，为芳基; L是螺基，金刚烷基，双环环己基，氘代类似物或其取代衍生物; R 1在每次出现时相同或不同，为D，F，烷基，芳基，烷氧基，甲硅烷基或可交联基团，其中相邻的R 1基团可以连接在一起形成芳香环; R2在每次出现时相同或不同，为H，D或卤素; a在每次出现时相同或不同，为0-4以上的整数; 并且n是大于0的整数。

    PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME
    3.
    发明申请
    PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME 审中-公开
    用于制造包含层的工艺和材料及其制品

    公开(公告)号：WO2011159876A2

    公开(公告)日：2011-12-22

    申请号：PCT/US2011040657

    申请日：2011-06-16

    Applicant: DU PONT ,  PARK KYUNG-HO ,  RADU NORA SABINA ,  JOHANSSON GARY A ,  DELANEY WILLIAM J ,  FENNIMORE ADAM ,  LECLOUX DANIEL DAVID

    Inventor： PARK KYUNG-HO ,  RADU NORA SABINA ,  JOHANSSON GARY A ,  DELANEY WILLIAM J ,  FENNIMORE ADAM ,  LECLOUX DANIEL DAVID

    IPC: G03F7/039

    CPC classification number: B05D3/06 ,  C08G2261/3162 ,  C08G2261/95 ,  G03F7/027 ,  G03F7/405 ,  H01L51/0004 ,  H01L51/0035 ,  H01L51/50 ,  H01L51/5048 ,  H01L51/52 ,  H01L51/56

    Abstract: There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer. The priming material has Formula I or Formula I': In Formula I or Formula I': Ar1 and Ar2 are the same or different and are aryl groups; R1 through R5 are independently the same or different at each occurrence and are D, F, alkyl, aryl, alkoxy, silyl, or a crosslinkable group; R6 is H, D, or halogen; a through e are independently an integer from 0 to 4; f is 1 or 2; g is 0, 1 or 2; h is 1 or 2; and n is an integer greater than 0.

    Abstract translation: 提供了一种用于在第一层上形成包含的第二层的方法，包括以下步骤：形成具有第一表面能的第一层; 用起动材料处理第一层以形成起动层; 以辐射模式曝光引发层，导致曝光区域和未曝光区域; 开发底漆层以有效地从未曝光区域去除底漆层，从而产生具有起泡层图案的第一层，其中底漆层的图案具有高于第一表面能的第二表面能; 以及通过在第一层上的起动层的图案上的液体沉积形成第二层。 起始材料具有式I或式I'：在式I或式I'中：Ar 1和Ar 2相同或不同，为芳基; R 1至R 5各自独立地相同或不同，为D，F，烷基，芳基，烷氧基，甲硅烷基或可交联基团; R6是H，D或卤素; a至e独立地为0至4的整数; f为1或2; g为0,1或2; h为1或2; 并且n是大于0的整数。

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