POLISHING APPARATUS AND POLISHING METHOD
    1.
    发明申请
    POLISHING APPARATUS AND POLISHING METHOD 审中-公开
    抛光装置和抛光方法

    公开(公告)号:WO2006041196A8

    公开(公告)日:2006-06-29

    申请号:PCT/JP2005019165

    申请日:2005-10-12

    CPC classification number: H01L21/02021 B24B9/065 B24B21/002

    Abstract: A polishing apparatus has a polishing tape (21), a supply reel (22) for supplying the polishing tape (21) to a contact portion (30) at which the polishing tape (21) is brought into contact with a notch portion (11) of a substrate (10), and a take-up reel (23) for winding up the polishing tape (21) from the contact portion (30). The polishing apparatus also has a first guide portion (24) having a guide surface (241) for supplying the polishing tape (21) directly to the contact portion (30), and a second guide portion (25) having a guide surface for supplying the polishing tape (21) to the take-up reel (23). The guide surface (241) of the first guide portion (24) and/or the guide surface of the second guide portion (25) has a shape corresponding to a shape of the notch portion (11) of the substrate (10).

    Abstract translation: 抛光装置具有研磨带(21),用于将研磨带(21)供给到研磨带(21)与切口部(11)接触的接触部(30)的供带盘(22) )和用于从所述接触部(30)卷绕所述研磨带(21)的卷取卷轴(23)。 抛光装置还具有第一引导部分(24),其具有用于将研磨带(21)直接供应到接触部分(30)的引导表面(241)和具有用于供应的引导表面的第二引导部分(25) 研磨带(21)到卷取卷轴(23)。 第一引导部(24)的引导面(241)和/或第二引导部(25)的引导面具有与基板(10)的切口部(11)的形状对应的形状。

    POLISHING APPARATUS AND POLISHING METHOD
    2.
    发明申请
    POLISHING APPARATUS AND POLISHING METHOD 审中-公开
    抛光设备和抛光方法

    公开(公告)号:WO2006041196A1

    公开(公告)日:2006-04-20

    申请号:PCT/JP2005/019165

    申请日:2005-10-12

    CPC classification number: H01L21/02021 B24B9/065 B24B21/002

    Abstract: A polishing apparatus has a polishing tape (21), a supply reel (22) for supplying the polishing tape (21) to a contact portion (30) at which the polishing tape (21) is brought into contact with a notch portion (11) of a substrate (10), and a take-up reel (23) for winding up the polishing tape (21) from the contact portion (30). The polishing apparatus also has a first guide portion (24) having a guide surface (241) for supplying the polishing tape (21) directly to the contact portion (30), and a second guide portion (25) having a guide surface for supplying the polishing tape (21) to the take-up reel (23). The guide surface (241) of the first guide portion (24) and/or the guide surface of the second guide portion (25) has a shape corresponding to a shape of the notch portion (11) of the substrate (10).

    Abstract translation: 抛光装置具有抛光带(21),用于将抛光带(21)供应到带有抛光带(21)的接触部分(30)的供应带盘(22) 与基片(10)的切口部分(11)接触;以及卷取卷轴(23),用于从接触部分(30)卷绕抛光带(21)。 该抛光装置还具有第一导向部分(24)和第二导向部分(25),该第一导向部分具有用于将抛光带(21)直接供应到接触部分(30)的导向表面(241) 将研磨带(21)送到卷取卷轴(23)。 第一引导部分(24)的引导表面(241)和/或第二引导部分(25)的引导表面具有与基板(10)的凹口部分(11)的形状相对应的形状。 / p>

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