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1.发明申请
公开(公告)号：WO2006076333A2
公开(公告)日：2006-07-20
申请号：PCT/US2006/000771
申请日：2006-01-11
Applicant: CABOT CORPORATION , MICHALUK, Christopher, A. , HUBER, Louis, E., Jr. , ALEXANDER, P., Todd , CARPENTER, Craig, M.
Inventor： MICHALUK, Christopher, A. , HUBER, Louis, E., Jr. , ALEXANDER, P., Todd , CARPENTER, Craig, M.
CPC classification number: C22F1/18 , C22F1/183 , C23C14/3414
Abstract: A method of making metal plates as well as sputtering targets is described. In addition, products made by the process of the present invention are further described. The present invention preferably provides a product with reduced or minimized marbleizing on the surface of the metal product which has a multitude of benefits.
Abstract translation: 描述制造金属板以及溅射靶的方法。 此外，进一步描述通过本发明的方法制备的产品。 本发明优选提供在金属产品的表面上具有减少或最小化的大理石的产品，其具有许多益处。
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2.发明申请
公开(公告)号：WO2005064037A3
公开(公告)日：2005-12-08
申请号：PCT/US2004042734
申请日：2004-12-20
Applicant: CABOT CORP , MICHALUK CHRISTOPHER A , HUBER LOUIS E , ALEXANDER P TODD
Inventor： MICHALUK CHRISTOPHER A , HUBER LOUIS E , ALEXANDER P TODD
CPC classification number: C23C14/3414 , C22F1/18 , C22F1/183
Abstract: A method of making metal plates as well as sputtering targets is described. In addition, products made by the process of the present invention are further described. The present invention preferably provides a product with reduced or minimized marbleizing on the surface of the metal product which has a multitude of benefits.
Abstract translation: 描述制造金属板以及溅射靶的方法。 此外，进一步描述通过本发明的方法制备的产品。 本发明优选提供在金属产品的表面上具有减少或最小化的大理石的产品，其具有许多益处。
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3.发明申请
公开(公告)号：WO2006076333A3
公开(公告)日：2006-09-28
申请号：PCT/US2006000771
申请日：2006-01-11
Applicant: CABOT CORP , MICHALUK CHRISTOPHER A , HUBER LOUIS E JR , ALEXANDER P TODD , CARPENTER CRAIG M
Inventor： MICHALUK CHRISTOPHER A , HUBER LOUIS E JR , ALEXANDER P TODD , CARPENTER CRAIG M
CPC classification number: C22F1/18 , C22F1/183 , C23C14/3414
Abstract: A method of making a sputtering target, comprising: providing a slab comprising at least one metal; a first rolling of said slab to form an intermediate plate, wherein said first rolling includes a plurality of rolling passes; and a second rolling to form a metal plate, wherein said second rolling includes a plurality of rolling passes, and wherein each of said rolling passes of said second rolling imparts a true strain reduction of about 0. 2 or more.
Abstract translation: 一种制造溅射靶的方法，包括：提供包含至少一种金属的板坯; 所述板坯的第一轧制形成中间板，其中所述第一轧制包括多个轧制道次; 以及第二轧制以形成金属板，其中所述第二轧制包括多个轧制道次，并且其中所述第二轧制的每个所述轧制道次赋予约0.2以上的真实应变减小。
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4.发明申请HIGH INTEGRITY SPUTTERING TARGET MATERIAL AND METHOD FOR PRODUCING BULK QUANTITIES OF SAME 审中-公开高完整性溅射靶材及生产散装数量的方法
公开(公告)号：WO2005064037A2
公开(公告)日：2005-07-14
申请号：PCT/US2004/042734
申请日：2004-12-20
Applicant: CABOT CORPORATION , MICHALUK, Christopher, A. , HUBER, Louis, E. , ALEXANDER, P., Todd
Inventor： MICHALUK, Christopher, A. , HUBER, Louis, E. , ALEXANDER, P., Todd
IPC: C23C14/34
CPC classification number: C23C14/3414 , C22F1/18 , C22F1/183
Abstract: A method of making metal plates as well as sputtering targets is described. In addition, products made by the process of the present invention are further described. The present invention preferably provides a product with reduced or minimized marbleizing on the surface of the metal product which has a multitude of benefits.
Abstract translation: 描述了一种制造金属板以及溅射靶的方法。 另外，进一步描述通过本发明的方法制造的产品。 本发明优选提供在金属产品表面具有减少的或最小化的纹理化的产品，其具有多种益处。
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