公开(公告)号：WO2008094607A1

公开(公告)日：2008-08-07

申请号：PCT/US2008/001237

申请日：2008-01-30

Applicant: CORTRON CORPORATION ,  HULL, Frank, A.

Inventor： HULL, Frank, A.

IPC: G02B5/20 ,  G03F7/004

CPC classification number: G03F7/202

Abstract: A system for forming printing features (10) on a printing plate includes a high energy density light source (20) that has an emission spectrum that includes actinic radiation and non-actinic radiation. A reflector assembly (22) directs light produced by the high energy density light source (20) in a light path. The printing plate (28) has a mask that defines locations of the printing features. A filter (24) is situated in the light path between the high energy density light source (20) and the printing plate (28), and is configured to remove the non-actinic radiation produced by the high energy density light source (20). A relative motion system (26/30, 32) is provided to cause the light emitted by the high energy density light source (20) to move with respect to the printing plate (28).

Abstract translation: 用于在印版上形成印刷特征（10）的系统包括具有包括光化辐射和非光化辐射的发射光谱的高能量密度光源（20）。 反射器组件（22）将由高能量密度光源（20）产生的光引导到光路中。 印版（28）具有限定印刷特征的位置的掩模。 过滤器（24）位于高能量密度光源（20）和印版（28）之间的光路中，并且被配置为去除由高能量密度光源（20）产生的非光化辐射， 。 提供相对运动系统（26/30,32）以使由高能量密度光源（20）发射的光相对于印版（28）移动。

公开(公告)号：WO2007012023A3

公开(公告)日：2009-04-30

申请号：PCT/US2006028081

申请日：2006-07-19

Applicant: CORTRON CORP ,  HULL FRANK A ,  LARSON ROGER L ,  PITZEN DAVID E

Inventor： HULL FRANK A ,  LARSON ROGER L ,  PITZEN DAVID E

IPC: G03F7/34 ,  G03F7/027

CPC classification number: G03F7/34 ,  G03F7/36

Abstract: A flexographic processing system provides a single workstation having a light exposure system for providing exposure of a flexographic plate and a thermal processing system for thermally processing the flexographic plate following exposure. The thermal processing system includes a heated element non-rotationally mounted to a press device that generates pressure between a first surface of the heated element and the flexographic plate. The thermal processing system also includes a material delivery mechanism that delivers absorbent material to the first surface of the heated element, wherein the absorbent material removes uncured photo curable material from the flexographic plate.

Abstract translation: 柔性版印刷处理系统提供具有曝光系统的单个工作站，用于提供柔性印版的曝光和用于在曝光之后热处理柔版印版的热处理系统。 热处理系统包括非旋转地安装到加压装置的加热元件，其在加热元件的第一表面和柔性版之间产生压力。 热处理系统还包括将吸收材料输送到加热元件的第一表面的材料输送机构，其中吸收材料从柔版印刷板上去除未固化的可光固化材料。

公开(公告)号：WO2007012023A2

公开(公告)日：2007-01-25

申请号：PCT/US2006/028081

申请日：2006-07-19

Applicant: CORTRON CORPORATION ,  HULL, Frank, A. ,  LARSON, Roger, L. ,  PITZEN, David, E.

Inventor： HULL, Frank, A. ,  LARSON, Roger, L. ,  PITZEN, David, E.

IPC: B41B1/02

CPC classification number: G03F7/34 ,  G03F7/36

Abstract: A flexographic processing system provides a single workstation having a light exposure system for providing exposure of a flexographic plate and a thermal processing system for thermally processing the flexographic plate following exposure. The thermal processing system includes a heated element non-rotationally mounted to a press device that generates pressure between a first surface of the heated element and the flexographic plate. The thermal processing system also includes a material delivery mechanism that delivers absorbent material to the first surface of the heated element, wherein the absorbent material removes uncured photocurable material from the flexographic plate.

Abstract translation: 柔性版印刷处理系统提供具有曝光系统的单个工作站，用于提供柔性印版的曝光和用于在曝光之后热处理柔版印版的热处理系统。 热处理系统包括非旋转地安装到加压装置的加热元件，其在加热元件的第一表面和柔性版之间产生压力。 热处理系统还包括将吸收材料输送到加热元件的第一表面的材料输送机构，其中吸收材料从柔版印刷板上去除未固化的可光固化材料。

公开(公告)号：WO2005082097A3

公开(公告)日：2005-11-17

申请号：PCT/US2005006422

申请日：2005-02-24

Applicant: CORTRON CORP ,  HULL FRANK A ,  HORRISBERGER BENN

Inventor： HULL FRANK A ,  HORRISBERGER BENN

IPC: B41C1/05 ,  B41N1/14 ,  G03F7/00

CPC classification number: G03F7/24

Abstract: An exposure system (10, 30) at least partially surrounds a photopolymer on a rotating cylinder ablation system (20, 36). A light source assembly (12, 32) linearly follows an ablation source (22, 34) and operates to expose the ablated (masked) photopolymer with high intensity illumination to expose all points on the photopolymer. In one embodiment, the light source assembly employs at least one plasma capillary light source (18, 38A, 38B) configured to illuminate the photopolymer with high intensity light .

Abstract translation: 曝光系统（10,30）至少部分地围绕旋转圆柱体消融系统（20,36）上的光聚合物。 光源组件（12,32）线性地跟随消融源（22,34）并且操作以用高强度照射来曝光消融（掩蔽）的光聚合物以曝光光聚合物上的所有点。 在一个实施例中，光源组件采用配置成以高强度光照射光聚合物的至少一个等离子体毛细管光源（18,38A，38B）。

公开(公告)号：WO2005082097A2

公开(公告)日：2005-09-09

申请号：PCT/US2005/006422

申请日：2005-02-24

Applicant: CORTRON CORPORATION ,  HULL, Frank, A. ,  HORRISBERGER, Benn

Inventor： HULL, Frank, A. ,  HORRISBERGER, Benn

IPC: B41C1/05 ,  B41N1/14 ,  G03F7/00

CPC classification number: G03F7/24

Abstract: An exposure system (10, 30) at least partially surrounds a photopolymer on a rotating cylinder ablation system (20, 36). A light source assembly (12, 32) linearly follows an ablation source (22, 34) and operates to expose the ablated (masked) photopolymer with high intensity illumination to expose all points on the photopolymer. In one embodiment, the light source assembly employs at least one plasma capillary light source (18, 38A, 38B) configured to illuminate the photopolymer with high intensity light .

Abstract translation: 曝光系统（10,30）至少部分地围绕旋转圆柱体消融系统（20,36）上的光聚合物。 光源组件（12,32）线性地跟随消融源（22,34）并且操作以用高强度照明来暴露消融（掩蔽的）光聚合物以暴露光聚合物上的所有点。 在一个实施例中，光源组件采用至少一个等离子体毛细管光源（18,38A，38B），其配置成用高强度光照射光聚合物。