公开(公告)号：WO9734171A3

公开(公告)日：1998-02-26

申请号：PCT/US9702949

申请日：1997-02-20

Applicant: JOHNSON KENNETH C

Inventor： JOHNSON KENNETH C

IPC: G02B21/00 ,  G03F7/20 ,  H01L21/027 ,  G02B

CPC classification number: G02B21/0044 ,  G02B21/0028 ,  G03F7/70091 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358

Abstract: A microscopy or lithography system using a low-resolution image projection system, having a very small numerical aperture and large image field, in conjunction with a microlens array (2), each element of which has a large numerical aperture but very small field. The projection system contains a small aperture stop (7) which is imaged by the microlenses (2) onto an array of diffraction-limited microspots on the microscope sample (6) or printing surface (12) at the microlens focal point positions, and the surface is scanned to build up a complete raster image from the focal point array. The system design thus circumvents the tradeoff between image resolution and field size which is the cause of much of the complexity and expense of traditional wide-field, high-NA microscopy and microlithography systems. The system makes possible flat field, distortion-free imaging, with accurate overlay, focus, and warp compensation, over image field larger than the practical limitations of conventional imaging systems. A digital micromirror device may be used as the image source, eliminating the need for photomasks in semiconductor manufacture.

公开(公告)号：WO2015012982A1

公开(公告)日：2015-01-29

申请号：PCT/US2014/043462

申请日：2014-06-20

Applicant: JOHNSON, Kenneth C.

Inventor： JOHNSON, Kenneth C.

IPC: G03F7/20 ,  H01S3/03 ,  H01S3/134

CPC classification number: G03F7/70275

Abstract: A DUV scanned-spot-array lithography system comprises an array of phase- Fresnel microlenses, which focus multiple radiation beams through intermediate foci at the object surface of a projection system. The intermediate foci are imaged by the projection system onto corresponding focused-radiation spots on an image plane, and the spots expose a photosensitive layer proximate the image plane as the layer is scanned in synchronization with modulation of the beams. The modulators may comprise micromechanical shutters proximate the intermediate foci for ON/OFF switching, in series with transmission grating modulators for gray-level control, and the microlenses may also be actuated to provide dynamic beam centering control. A nodal line printing technique may be used to provide ultra-high-resolution and high-throughput maskless printing capability in conjunction with multi-patterning or dual-wavelength recording processes.

Abstract translation: DUV扫描点阵阵列光刻系统包括相位菲涅耳微透镜的阵列，其将多个辐射束聚焦在投影系统的物体表面处的中间焦点。 中间焦点通过投影系统成像到图像平面上的相应的聚焦辐射点上，并且当该层与光束的调制同步地扫描该层时，该光点在图像平面附近曝光感光层。 调制器可以包括靠近用于ON / OFF切换的中间焦点的微机械快门，与用于灰度级控制的透射光栅调制器串联，并且微透镜也可以被致动以提供动态光束定中心控制。 可以使用节点线打印技术来提供与多图案化或双波长记录处理相结合的超高分辨率和高吞吐量的无掩模打印能力。

公开(公告)号：WO1997034171A2

公开(公告)日：1997-09-18

申请号：PCT/US1997002949

申请日：1997-02-20

Applicant: JOHNSON, Kenneth, C.

IPC: G02B00/00

CPC classification number: G02B21/0044 ,  G02B21/0028 ,  G03F7/70091 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358

Abstract: A microscopy and/or lithography system uses a comparatively low-resolution image projection system, which has a very small numerical aperture but large image field, in conjunction with a microlens array comprising miniature lens elements, each of which has a large numerical aperture but very small field. The projection system contains a small aperture stop which is imaged by the microlenses onto an array of diffraction-limited microspots on the microscope sample or printing surface at the microlens focal point positions, and the surface is scanned to build up a complete raster image from the focal point array. The system design thus circumvents the tradeoff between image resolution and field size which is the source of much of the complexity and expense of conventional wide-field, high-NA microscopy and microlithography systems. The system makes possible flat field, distortion-free imaging, with accurate overlay, focus, and warp compensation, over very large image fields (larger than the practical limits of conventional imaging means). In one embodiment it would use a Digital Micromirror Device as the image source, potentially eliminating the need for photomasks in semiconductor manufacture.

Abstract translation: 显微镜和/或光刻系统使用相对低分辨率的图像投影系统，其具有非常小的数值孔径但具有大的图像场，结合包括微型透镜元件的微透镜阵列，每个微透镜元件具有大的数值孔径但非常大 小领域。 该投影系统包含一个小孔径光阑，其通过微透镜成像到微透镜焦点位置上的显微镜样品或印刷表面上的衍射限制微阵列上，并且扫描该表面以形成完整的光栅图像 焦点阵列 因此，系统设计避免了图像分辨率和场尺寸之间的折中，这是常规广域，高NA显微镜和微光刻系统的复杂性和费用的大部分来源。 在非常大的图像场（大于常规成像装置的实际限制）下，该系统可以实现平场，无失真成像，具有精确的覆盖，聚焦和翘曲补偿。 在一个实施例中，它将使用数字微镜器件作为图像源，可能消除对半导体制造中的光掩模的需要。

公开(公告)号：WO1990002963A1

公开(公告)日：1990-03-22

申请号：PCT/US1989003810

申请日：1989-09-01

Applicant: JOHNSON, Kenneth, C.

IPC: G02B05/18

CPC classification number: G02B5/1895 ,  G02B5/1876 ,  G02B27/0025 ,  G02B27/0037 ,  G02B27/4211 ,  G02B27/4288

Abstract: A transmission grating (5) is used to reduce chromatic aberration in an optical system, wherein the system's chromatic dispersion is offset and substantially canceled by the grating's diffraction-induced dispersion. The grating (5) comprises a Fresnel-type pattern of microscopic facets (4) molded directly into one of the system's refractive optical surface (3). The facets (4) would typically have a profile height of around 4.10-5 inch and a profile width of at least 10-3 inch. In its primary intended application, the invention would function to improve the optical performance of a Fresnel lens used to concentrate direct sunlight into a piped daylight illumination system. For this application, about a ten-fold reduction in chromatic dispersion would be attained with only about a 2 % loss in optical efficiency.

公开(公告)号：WO1990013147A1

公开(公告)日：1990-11-01

申请号：PCT/US1990001944

申请日：1990-04-10

Applicant: JOHNSON, Kenneth, C.

IPC: H01L31/052

CPC classification number: H01L31/0547 ,  F24S23/31 ,  F24S30/452 ,  F24S2025/017 ,  F24S2030/133 ,  F24S2030/134 ,  F24S2030/136 ,  Y02B10/10 ,  Y02B10/20 ,  Y02E10/43 ,  Y02E10/47 ,  Y02E10/52

Abstract: This invention is a novel solar tracking mechanism incorporating a number of practical features that give it superior environmental resilience and exceptional tracking accuracy. The mechanism comprises a lightweight space-frame assembly supporting an array of point-focus Fresnel lenses in a two-axis tracking structure. The system is enclosed under a glass cover which isolates it from environmental exposure and enhances tracking accuracy by eliminating wind loading. Tracking accuracy is also enhanced by the system's broad-based tracking support. The system's primary intended application would be to focus highly concentrated sunlight into optical fibers for transmission to core building illumination zones, and the system may also have potential for photovoltaic or photothermal solar energy conversion.