公开(公告)号：WO2006020424A3

公开(公告)日：2007-06-28

申请号：PCT/US2005026891

申请日：2005-07-29

Applicant: VEECO INSTR INC ,  ARMOUR ERIC A ,  GURARY ALEX ,  KADINSKI LEV ,  DOPPELHAMMER ROBERT ,  TOMPA GARY S ,  KATS MIKHAIL

Inventor： ARMOUR ERIC A ,  GURARY ALEX ,  KADINSKI LEV ,  DOPPELHAMMER ROBERT ,  TOMPA GARY S ,  KATS MIKHAIL

IPC: C23C16/00 ,  C23F1/00

CPC classification number: C23C16/45565 ,  C23C16/45572 ,  C23C16/45574

Abstract: A gas distribution injector [150] for chemical vapor deposition reactors [100] has precursor gas inlets [160, 165] disposed at spaced-apart locations on an inner surface [155] facing downstream toward a substrate [135], and has carrier openings [167] disposed between the precursor gas inlets [160, 165]. One or more precursor gases [180, 185] are introduced through the precursor gas inlets [160, 165], and a carrier gas [187] substantially nonreactive with the precursor gases is introduced through the carrier gas openings [167]. The carrier gas minimizes deposit formation on the injector [150]. The carrier gas openings may be provided by a porous plate [230] defining the surface or via carrier inlets [167] interspersed between precursor inlets. The gas inlets may removable [1780] or coaxial [1360].

Abstract translation: 用于化学气相沉积反应器的气体分配注入器[150]具有设置在面向衬底[135]的下游的内表面155上的间隔位置的前体气体入口[160,165]，并且具有载体开口 [167]设置在前体气体入口[160,165]之间。 通过前体气体入口[160,165]引入一种或多种前体气体[180,185]，并且通过载气开口[167]引入基本上与前体气体反应的载气[187]。 载气最小化喷射器上的沉积物形成[150]。 载气开口可以由限定表面的多孔板（230）或散布在前体入口之间的经由载体入口[167]提供。 气体入口可以移除[1780]或同轴[1360]。

公开(公告)号：WO2013033591A1

公开(公告)日：2013-03-07

申请号：PCT/US2012/053434

申请日：2012-08-31

Applicant: PRESIDENT AND FELLOWS OF HARVARD COLLEGE ,  YU, Nanfang ,  CAPASSO, Federico ,  GABURRO, Zeno ,  GENEVET, Patrice ,  KATS, Mikhail ,  AIETA, Francesco

Inventor： YU, Nanfang ,  CAPASSO, Federico ,  GABURRO, Zeno ,  GENEVET, Patrice ,  KATS, Mikhail ,  AIETA, Francesco

IPC: H01S3/00

CPC classification number: G02F1/01 ,  B82Y20/00 ,  G02B1/002 ,  G02F2203/10 ,  H01Q15/0006 ,  H01Q15/10 ,  Y10S977/773 ,  Y10S977/774

Abstract: An optical plate includes a substrate and a resonator structure formed on or in the substrate, wherein the resonator structure is configured to produce an abrupt change in phase, amplitude and/or polarization of incident radiation.

Abstract translation: 光学板包括衬底和形成在衬底上或衬底中的谐振器结构，其中谐振器结构被配置为产生入射辐射的相位，振幅和/或极化的突然变化。

公开(公告)号：WO2006020424A2

公开(公告)日：2006-02-23

申请号：PCT/US2005/026891

申请日：2005-07-29

Applicant: VEECO INSTRUMENTS INC. ,  ARMOUR, Eric, A. ,  GURARY, Alex ,  KADINSKI, Lev ,  DOPPELHAMMER, Robert ,  TOMPA, Gary, S. ,  KATS, Mikhail

Inventor： ARMOUR, Eric, A. ,  GURARY, Alex ,  KADINSKI, Lev ,  DOPPELHAMMER, Robert ,  TOMPA, Gary, S. ,  KATS, Mikhail

IPC: C23C16/00

CPC classification number: C23C16/45565 ,  C23C16/45572 ,  C23C16/45574

Abstract: A gas distribution injector [150] for chemical vapor deposition reactors [100] has precursor gas inlets [160, 165] disposed at spaced-apart locations on an inner surface [155] facing downstream toward a substrate [135], and has carrier openings [167] disposed between the precursor gas inlets [160, 165]. One or more precursor gases [180, 185] are introduced through the precursor gas inlets [160, 165], and a carrier gas [187] substantially nonreactive with the precursor gases is introduced through the carrier gas openings [167]. The carrier gas minimizes deposit formation on the injector [150]. The carrier gas openings may be provided by a porous plate [230] defining the surface or via carrier inlets [167] interspersed between precursor inlets. The gas inlets may removable [1780] or coaxial [1360].

Abstract translation: 用于化学气相沉积反应器的气体分配注入器[150]具有设置在面向衬底[135]的下游的内表面155上的间隔位置的前体气体入口[160,165]，并且具有载体开口 [167]设置在前体气体入口[160,165]之间。 通过前体气体入口[160,165]引入一种或多种前体气体[180,185]，并且通过载气开口[167]引入基本上与前体气体反应的载气[187]。 载气最小化喷射器上的沉积物形成[150]。 载气开口可以由限定表面的多孔板（230）或散布在前体入口之间的经由载体入口[167]提供。 气体入口可以移除[1780]或同轴[1360]。